Optical and Quantum Electronics

, Volume 38, Issue 15, pp 1203–1216 | Cite as

Analysis method of the effect of fabrication errors on a planar waveguide demultiplexer



The impact of fabrication errors on a planar waveguide demultiplexer is analyzed based on an analytical method. The explicit expression of the transfer function taking into account phase and amplitude errors is presented in order to analyze the loss and crosstalk of the demultiplexer caused by fabrication errors. A basic requirement for the demultiplexer with a certain crosstalk criterion can be easily obtained. Using an etched diffraction grating demultiplexer as an example, it is shown that the analytical results have a good agreement with results from a numerical method.


planar waveguide demultiplexer etched diffraction grating (EDG) phase and amplitude errors loss crosstalk WDM 


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Copyright information

© Springer Science+Business Media, LLC 2007

Authors and Affiliations

  1. 1.State Key Laboratory of Modern Optical InstrumentationZhejiang University, Centre for Optical and Electromagnetic ResearchHangzhouChina
  2. 2.Division of Electromagnetic TheoryRoyal Institute of Technology, Alfven LaboratoryStockholmSweden

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