Deposition of Coatings Under Pulsed Action of Glow Discharge
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The microstructure of coatings deposited under radiation heating in vacuum at different parameters of pulsed glow discharge is studied. It is shown that depending on the length of the pulses of the glow discharge the deposited coatings may have alternating different-thickness chromium carbide layers.
Key wordspulse glow discharge substrate pyrolytic chromium carbide coating organometallic compound deposition process
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