Measurement Techniques

, Volume 59, Issue 8, pp 822–825 | Cite as

Measurement of the Thickness Nonuniformity of Nanofilms Using an Electron Probe Method

  • S. A. Darznek
  • A. Yu. Kuzin
  • V. B. Mityukhlyaev
  • M. A. Stepovich
  • P. A. Todua
  • M. N. Filippov

We propose an electron-probe method for measuring thickness nonuniformity in nanofilms, using the dependence of the ratio of the intensities of the characteristic x-ray film elements on its thickness. The calibration dependence is computed simulating the interaction of electrons with the sample by a Monte-Carlo method.


low-voltage electron probe x-ray microanalysis nanofilm thickness measurement Monte-Carlo method 


  1. 1.
    R. W. Johnson, A. Hultqvist, and S. F. Bent, “A brief review of atomic layer deposition: from fundamentals to applications,” Mater. Today, 17, No. 5, 236–246 (2014).CrossRefGoogle Scholar
  2. 2.
    V. P. Gavrilenko, A. Y. Kuzin, V. B. Mityukhlyaev, et al., “Measurement of the thickness of oxide fi lm on a silicon surface using the electron-probe method,” Izmer. Tekhn., No. 9, 13–16 (2016).Google Scholar
  3. 3.
    K. Kanaya and S. Okayama, “Penetration and energy-loss theory of electrons in solid targets,” J. Phys. D: Appl. Phys., 5, 43–58 (1972).ADSCrossRefGoogle Scholar
  4. 4.
    G. H. Zschornack, Handbook of x-Ray Data, Springer Science & Business Media, London (2007).Google Scholar
  5. 5.
    M. Procop, M. Radtke, M. Krumrey, and K. Hasche, “Electron probe microanalysis (EPMA) measurement of thin-film thickness in the nanometre range,” Analyt. Bioanalyt. Chem., 374, No. 4, 631–634 (2002).CrossRefGoogle Scholar
  6. 6.
    C. S. Campos, M. A. Z. Vasconcellos, X. Llovet, and F. Salvat, “Thickness determination of ultra-thin films on Si substrates by EPMA,” Microchim. Acta, 145, No. 1–4, 13–17 (2004).CrossRefGoogle Scholar
  7. 7.
    D. C. Joy, Monte Carlo Modeling for Electron Microscopy and Microanalysis, Univ. Press, Oxford (1995).Google Scholar
  8. 8.
    D. C. Joy and S. Luo, “An empirical stopping power relationship for low-energy electrons,” Scanning, 11, No. 4, 176–180 (1989).Google Scholar
  9. 9.
    C. Merlet, “Maximum of the x-ray depth distribution in EPMA at normal incidence: an analytical expression,” Microbeam Analysis, 4, 239–253 (1995).MathSciNetGoogle Scholar
  10. 10.
    GOST R 8.736-2011, GSI. Direct Measurements Repeated. Methods for Processing Measurement Results. The Main Provisions. Google Scholar

Copyright information

© Springer Science+Business Media New York 2016

Authors and Affiliations

  • S. A. Darznek
    • 1
  • A. Yu. Kuzin
    • 2
  • V. B. Mityukhlyaev
    • 1
  • M. A. Stepovich
    • 3
  • P. A. Todua
    • 1
  • M. N. Filippov
    • 1
    • 4
  1. 1.Research Center for the Study of the Properties of Surfaces and Vacuum (NITsPV)MoscowRussia
  2. 2.All-Russia Research Institute of Metrological Service (VNIIMS)MoscowRussia
  3. 3.Kaluga State UniversityKalugaRussia
  4. 4.Institute of General and Inorganic Chemistry, Russian Academy of Sciences (IONKh RAN)MoscowRussia

Personalised recommendations