Novel adamantane-based periodic mesoporous organosilica film with ultralow dielectric constant and high mechanical strength
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In this work, a novel bridged organosilane precursor, adamantane-bridged organosilane (ADBO), was synthesized successfully which was employed to prepare adamantane-based (ADH-based) periodic mesoporous organosilica (PMO) thin film in the presence of porogen and acid catalyst via evaporation-induced self-assembly (EISA) after spin-coating procedure. The resultant ADH-based PMO thin films were characterized by FTIR, NMR, TEM, and small-angle XRD. The ADH-based PMO thin film with weight ratio of porogen to ADBO (0.75:1) possesses low dielectric constant (1.55 ± 0.04@1 MHz), excellent Young’s modulus (6.69 ± 0.54 GPa), and ideal hydrophobic property (90.2° of water contact angle) simultaneously. These outstanding properties of ADH-based PMO film can be ascribed to lower polarity, lower density, and rigid cavity structure of adamantane, which suggests its potential application as high-performance low-κ material in next-generation microelectronics.
KeywordsPeriodic mesoporous organosilica Low electric constant Mechanical property Thin film
This work was financially supported by National Natural Science Foundation of China (Grant No. 21201175, 61505123, and 21601065), NSFC––Guangdong Jointed Funding (U1601202), NSFC––Shenzhen Robot Jointed Funding (U1613215), Guangdong and Shenzhen Innovative Research Team Program (No. 2011D052, KYPT20121228160843692), Key Laboratory of Guangdong Province (2014B030301014), and R&D Funds for basic Research Program of Shenzhen (Grant No. JCYJ20120615140007998, 20150401145529012, and 20150525092940976) and Shenzhen Fundamental Research Program (Grant No. JCYJ20160331191741738 and JSGG20160229194437896).
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Conflict of interest
The authors declare that they have no conflict of interest.
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