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Journal of Sol-Gel Science and Technology

, Volume 81, Issue 2, pp 313–320 | Cite as

Formation of local thorium silicate compound by electrochemical deposition from an acetone solution of thorium nitrate

  • P. V. Borisyuk
  • О. S. Vasilyev
  • А. V. Krasavin
  • Yu. Yu. Lebedinskii
  • V. I. Troyan
  • E. V. Chubunova
  • S. P. Derevyashkin
Original Paper: Functional coatings, thin films and membranes (including deposition techniques)
  • 111 Downloads

Abstract

The results of the study of local formation (diameter of deposited area is about 100 μm) of thorium oxide coatings on SiO2/Si(001) surface by electrochemical deposition are presented. It was found that the electrochemical deposition of thorium atoms from an acetone solution of Th(NO3)4 on silicon surface lead to the formation of thorium-based films. The results of surface analysis by local X-ray photoelectron spectroscopy and X-ray photoemission indicate that these films contain of thorium-, silicon-, oxygen- and carbon-based compounds. After 30 h of annealing at 1350 °C in atmosphere carbon pulled completely, and the compound transforms into thorium silicate films ThSiO4 (Huttonite). Our primary study of ThSiO4 compound by reflection electron energy loss spectroscopy showed that this system have energy gap ~7.7 eV and can be useful for further research of «nuclear clocks» as well as for «nuclear battery».

Graphical Abstract

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Keywords

Local electrochemical deposition Thorium Silicate Band structure XPS REELS GIXRD 

Notes

Acknowledgement

The authors are grateful to V.G. Efimov and M.M. Grehov for help in experimental processing. The work was supported by the Russian Science Foundation (Project No. 16-19-00168).

Compliance with ethical standards

Conflict of interest

The authors declare that they have no competing interests.

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Copyright information

© Springer Science+Business Media New York 2016

Authors and Affiliations

  1. 1.National Research Nuclear University “MEPhI” (Moscow Engineering Physics Institute)MoscowRussia

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