Preparation and application of poly(alkoxytitanate) as a TiO2 precursor with high storage stability
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Titanium dioxide is a basic material of our daily life. Because of its favourable properties, such as harmlessness, chemical stability, photocatalytic activity, or whiteness it is increasingly applied in both micro and nano particles and thin films and coating. One of the available procedures for film forming is the sol–gel technology, an inexpensive low temperature process with wide possibilities to vary film properties by changing the composition of the precursor solution or other parameters. In the paper a new precursor polymer for TiO2 film-preparation with high storage and processing stabilities is introduced and applied in thin film forming. The new precursor poly(alkoxytitanate) is prepared by a one step, water-free sol–gel method. A smooth TiO2 film can be prepared using this precursor by spin-coating followed by H2-plasma curing. Comparing to a common precursor such as Ti(O–iPr)4, this precursor has a good solubility in different solvents and a much higher storage stability. The easy to modify precursor end groups enable the tailoring of properties regarding to hydrolysis to both TiO2 particles and films.
KeywordsWater free sol–gel technology TiO2 precursor polymer Hydrolytic stability Film formation
The financial support of the Deutsche Forschungsgemeinschaft (Project MO682/12-1) is gratefully acknowledged.
- 10.Harris CS (2003) Glass Res 12:32Google Scholar
- 25.Sakai N, Fujishima A, Watanabe T, Hashimoto K (2001) J Phys Chem B 105(15):3023–3026Google Scholar
- 29.Fuyuki T, Matsunami H(1986) Jpn J Appl Phys Part 1 25(9):1288–1291Google Scholar
- 32.Morris HB, Plano (1978) Tex method of depositing titanium dioxide (rutile) as a gate dielectric for MIS device fabrication. 4,200,474Google Scholar
- 35.Schroder H (1969) Physics of thin films. Academic, New York, vol 5, p 87Google Scholar
- 38.NMR-Reference, 2 edn. vol 1, p 508Google Scholar
- 40.Berger S, Smith WB, Marth CF, Raguse B, Reetz MT (1990) Magn Reson Chem 28(559-560559-560):559–560Google Scholar