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Modified procedure for the sol–gel processing of indium–tin oxide (ITO) films

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Abstract

Dispersions of crystalline nanoscaled ITO and solutions of amorphous precursors were used for the preparation of transparent conductive films on glass both by large area dip-coating (30 × 30 cm2) and pad-printing. The advantages of both types of coating materials regarding single layer thickness and conductivity were combined by a coating-infiltration procedure. The resulting films showed a specific resistivity down to 1.77 10E−03 Ω cm after treatment in reducing atmosphere and an increased resistance to subsequent storage in air.

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Acknowledgements

The experimental support of S. Mehlig-Gromotka and I. Mospan is gratefully acknowledged. We acknowledge the dispersions and inks containing nanoscaled ITO provided by the Evonik Degussa Creavis as well as financial support within the frame of the projects of the Nanotronics Science-to-Business Center, financially supported by the state of North-Rhine Westphalia and co-financed by the European Union. Parts of this work have been funded within the framework METCO of the Fraunhofer-Gesellschaft.

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Authors and Affiliations

  1. Evonik Degussa GmbH, Creavis Technologies & Innovation, Paul-Baumann-Straße 1, 45764, Marl, Germany

    Anna Prodi-Schwab & Thomas Lüthge

  2. Fraunhofer-Institut für Silicatforschung, Neunerplatz 2, 97082, Würzburg, Germany

    Rainer Jahn, Bettina Herbig & Peer Löbmann

Authors
  1. Anna Prodi-Schwab
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  2. Thomas Lüthge
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  3. Rainer Jahn
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  4. Bettina Herbig
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  5. Peer Löbmann
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Correspondence to Peer Löbmann.

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Prodi-Schwab, A., Lüthge, T., Jahn, R. et al. Modified procedure for the sol–gel processing of indium–tin oxide (ITO) films. J Sol-Gel Sci Technol 47, 68–73 (2008). https://doi.org/10.1007/s10971-008-1749-5

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  • DOI: https://doi.org/10.1007/s10971-008-1749-5

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