Photocurable silica hybrid organic–inorganic films for photonic applications
We report the preparation of hybrid organic–inorganic films deposited by dip-coating from a base-catalyzed sol containing tetraethoxysilane and 3-methacryloxypropyltrimethoxysilane as the silicon source, and ethyl-2,4,6-trimethylbenzoylphenylphosphinate as the photoinitiator. The films were cured with a UV lamp, obtaining a change in refractive index upon UV irradiation through the formation of an interpenetrated silica-methacrylate network. The refractive index increased of Δn = 14 × 10−3 after UV treatment. The synthesis is simple and reproducible and yields films with optical quality which can be useful as materials for applications in optics and information storage.
KeywordsSol–gel Methacryloxypropyltrimethoxysilane UV curing Hybrid organic–inorganic Photopolymerization Thin films
This research was supported by the Italian Ministero dell’Università e della Ricerca (MiUR) through the grants: PRIN (contract n. 2005039071_005), FIRB2001 (RBNE01P4JF) and FIRB2003 (RBNE033KMA). Prof. Masahide Takahashi is acknowledged for helpful discussion.