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Photocurable silica hybrid organic–inorganic films for photonic applications

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Abstract

We report the preparation of hybrid organic–inorganic films deposited by dip-coating from a base-catalyzed sol containing tetraethoxysilane and 3-methacryloxypropyltrimethoxysilane as the silicon source, and ethyl-2,4,6-trimethylbenzoylphenylphosphinate as the photoinitiator. The films were cured with a UV lamp, obtaining a change in refractive index upon UV irradiation through the formation of an interpenetrated silica-methacrylate network. The refractive index increased of Δn = 14 × 10−3 after UV treatment. The synthesis is simple and reproducible and yields films with optical quality which can be useful as materials for applications in optics and information storage.

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Acknowledgements

This research was supported by the Italian Ministero dell’Università e della Ricerca (MiUR) through the grants: PRIN (contract n. 2005039071_005), FIRB2001 (RBNE01P4JF) and FIRB2003 (RBNE033KMA). Prof. Masahide Takahashi is acknowledged for helpful discussion.

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Correspondence to Plinio Innocenzi.

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Costacurta, S., Malfatti, L., Falcaro, P. et al. Photocurable silica hybrid organic–inorganic films for photonic applications. J Sol-Gel Sci Technol 44, 59–64 (2007). https://doi.org/10.1007/s10971-007-1594-y

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  • DOI: https://doi.org/10.1007/s10971-007-1594-y

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