UV assisted pyrolysis of solution deposited BiFeO3 multiferroic thin films. Effects on microstructure and functional properties
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BiFeO3 thin films were processed on platinized silicon substrate via chemical solution deposition. Short wave UV assisted pyrolysis was conducted in oxygen atmosphere in order to obtain a fine and homogeneous grain structure. Phase pure thin films with a pronounced (100) texture were obtained at a fairly low annealing temperature of 600°C. For comparison specimens processed without UV assisted pyrolysis were also investigated. It is shown that UV assisted pyrolysis leads to a substantial improvement of leakage resistance properties. Polarization switching could also be obtained using capacitance-voltage (C-V) curves. The leakage current was investigated as a function of temperature. Interpretation in terms of Frenkel-Poole mechanism leads to a high trap depth in the range of 2.4 eV which is attributed to the creation of Fe2+ centres. For both microstructures investigated well saturated magnetization loops were obtained with a remnant magnetization of 2Mr = 5.4 emu/cm3 and a coercive fields in the range of 2Hc = 200 Oe. Slightly higher saturation magnetization 2Ms of 55.4 emu/cm3 was obtained for UV assisted pyrolysis in comparison to 45.8 emu/cm3 for the thin films processed without UV.
KeywordsMultiferroic BiFeO3 Dielectric properties Ferroelectric properties Leakage current Magnetic properties
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