Propagation of ultrafast pulses in the anomalous-dispersion regime of silicon-on-insulator strip nanowaveguides
The dynamic evolution of ultrafast high-intensity pulses with a 100 fs half-width at 1/e intensity point based on the silicon-on-insulator (SOI) strip nanowaveguides is considered and investigated numerically under the condition of anomalous group-velocity dispersion (GVD) regime. For ultrafast high-intensity pulses propagating in millimeter-long SOI nanowaveguides, the interplay between the dispersion and nonlinear effects such as the two-photon absorption, free-carrier absorption, free-carrier dispersion, and self-phase modulation has to be taken into account, which results in the significant optical wave breaking phenomenon that occurs near the pulse leading edge for an unchirped Gaussian pulse in the anomalous GVD regime. However, when the input Gaussian pulse with linear up-chirp is introduced, the position of the optical wave breaking shifts from the leading pulse edge to its trailing edge along the several millimeters-long SOI nanowaveguides.
Keywordsintegrated optics silicon-on-insulator technology nonlinear optics ultrafast phenomena
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