Advertisement

Journal of Low Temperature Physics

, Volume 138, Issue 1–2, pp 355–360 | Cite as

Equilibrium helium films under the influence of surface roughness

  • J. Klier
  • M. Zech
  • A. Fubel
  • P. Leiderer
  • V. Shikin
Article

No Heading

Equilibrium helium films adsorbed on solid substrates are investigated. Due to their thickness these films are mainly in the retardation regime where the influence of the roughness of the substrates, δ(x), can be strong enough to be observed. For the definition of δ(x) we use a simple corrugation model. This model is supported by experimental results using the surface plasmon resonance technique to determine the thickness of helium films grown on different Ag surfaces.

Keywords

Helium Surface Roughness Surface Plasmon Resonance Magnetic Material Plasmon Resonance 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    1. H.B.G. Casimir and D. Polder, Phys. Rev. 73, 360 (1948).Google Scholar
  2. 2.
    2. I.E. Dzyaloshinskii, E.M. Lifshitz, and L.P. Pitaevskii, Adv. Phys. 10, 165 (1961).Google Scholar
  3. 3.
    3. S. Putterman. Superfluid hydrodynamics, North Holland series in low temperature physics, Amsterdam (1974).Google Scholar
  4. 4.
    4. see e.g., L.W. Bruch, M.W. Cole, and E. Zaremba, Physical Adsorption: Forces and Phenomena, Clarendon Press, Oxford (1997); and references therein.Google Scholar
  5. 5.
    5. E.S. Sabisky and C.H. Anderson, Phys. Rev. A 7, 790 (1973).Google Scholar
  6. 6.
    6. P. Pfeifer and D. Avenir, J. Chem. Phys. 79, 3558 (1983).Google Scholar
  7. 7.
    7. P. Pfeifer, Y. Wu, M. Cole, and Y. Krim, Phys. Rev. Lett. 62, 1997 (1989).Google Scholar
  8. 8.
    8. V. Panella and J. Krim, Phys. Rev. E 49, 4179 (1994).Google Scholar
  9. 9.
    9. K. Meeke and J. Krim, Phys. Rev. B 53, 2073 (1996).Google Scholar
  10. 10.
    10. A. Faustein, Diploma thesis, pp. 41–42 (2004).Google Scholar
  11. 11.
    11. L.D. Landau and E.M. Lifshitz, Hydrodynamics, Akademie Verlag Berlin (1991).Google Scholar
  12. 12.
    12. M. Robbins, D. Andelman, and J. Joanny, Phys. Rev. A 43, 4344 (1991).Google Scholar
  13. 13.
    13. Yu. P. Monarkha, Sov. J. Low Temp. Phys. 18, 145 (1992).Google Scholar
  14. 14.
    14. D. Reinelt, J. Klier, and P. Leiderer, J. Low Temp. Phys. 113, 805 (1998).Google Scholar
  15. 15.
    15. V. Iov, J. Klier, and P. Leiderer, J. Low Temp. Phys. 126, 367 (2002).Google Scholar

Copyright information

© Springer Science+Business Media, Inc. 2005

Authors and Affiliations

  • J. Klier
    • 1
  • M. Zech
    • 1
  • A. Fubel
    • 1
  • P. Leiderer
    • 1
  • V. Shikin
    • 2
  1. 1.Department of PhysicsUniversity of KonstanzKonstanzGermany
  2. 2.ISSPChernogolovka, Moscow DistrictRussia

Personalised recommendations