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Journal of Fusion Energy

, Volume 33, Issue 6, pp 689–692 | Cite as

Application of Plasma Focus Device in Fast Industrial Radiography

  • M. A. Tafreshi
  • M. M. Nasseri
  • N. Nabipour
  • D. Rostamifard
  • A. Nasiri
Original Research

Abstract

This paper deals with application of the plasma focus (PF) devices in fast industrial radiography. The results of radiography of a fan unit in both static and rotating states are presented. To do this, an X-ray video camera and the hard X-ray emission due to a PF device have been used. Moreover, the gray levels of the radiograph have been employed to find out the average effective X-ray energy in radiography of the rotating fan.

Keywords

Plasma focus Fast radiography X-ray source 

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Copyright information

© Springer Science+Business Media New York 2014

Authors and Affiliations

  • M. A. Tafreshi
    • 1
  • M. M. Nasseri
    • 1
  • N. Nabipour
    • 1
  • D. Rostamifard
    • 1
  • A. Nasiri
    • 1
  1. 1.Institute of Nuclear Science and Technology, School of Plasma Physics and Nuclear FusionAEOITehranIran

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