Application of Plasma Focus Device in Fast Industrial Radiography
- 110 Downloads
This paper deals with application of the plasma focus (PF) devices in fast industrial radiography. The results of radiography of a fan unit in both static and rotating states are presented. To do this, an X-ray video camera and the hard X-ray emission due to a PF device have been used. Moreover, the gray levels of the radiograph have been employed to find out the average effective X-ray energy in radiography of the rotating fan.
KeywordsPlasma focus Fast radiography X-ray source
- 1.R. Halmshaw, Industrial Radiology Techniques (Wykeham Publications, London, 1971). ISBN: 0 85109 2101Google Scholar
- 4.M. Barbaglia, et al., Experimental study of the hard X-ray emissions in a plasma focus of hundreds of Joules. Plasma Phys. Control 51(4) (2009). doi: 10.1088/0741-3335/51/4/045001
- 10.M.A. Tafreshi et al., Dena, a new PF device. Nukleonika 46(Suppl 1), 85–87 (2001)Google Scholar