Journal of Fusion Energy

, Volume 31, Issue 6, pp 586–590 | Cite as

Characterization of Microroughness Parameters in Titanium Nitride Thin Films Grown by DC Magnetron Sputtering

  • Ali Gelali
  • Azin Ahmadpourian
  • Reza Bavadi
  • M. R. Hantehzadeh
  • Arman Ahmadpourian
Original Research


The morphological parameter of a thin film surface can be characterized by power spectral density (PSD) functions which provide a better description to the topography than the root mean square roughness and imparts several useful information of the surface including fractal and superstructure contributions. In the present work PSD spectra computed from atomic force microscopy (AFM) data were used for studying the morphology of three different titanium nitride thin films obtained by dc magnetron sputtering system. The power values of PSD for the AFM data were determined by the fast Fourier transforms algorithms. We investigate the effect of substrate temperature and crystallite sizes on the roughness of thin films surface.


Power spectral density AFM Fractal Titanium nitride Fast Fourier transform 


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Copyright information

© Springer Science+Business Media, LLC 2012

Authors and Affiliations

  • Ali Gelali
    • 1
  • Azin Ahmadpourian
    • 2
  • Reza Bavadi
    • 3
  • M. R. Hantehzadeh
    • 4
  • Arman Ahmadpourian
    • 2
  1. 1.Young Researchers Club, Kermanshah branchIslamic Azad UniversityKermanshahIran
  2. 2.Islamic Azad University of KhorramabadKhorramabadIran
  3. 3.Department of PhysicsIslamic Azad University of Khorrasgan IsfahanKhorrasgan IsfahanIran
  4. 4.Plasma Physics Research CenterScience and Research Branch Islamic Azad UniversityTehranIran

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