Using Mather-Type Plasma Focus Device for Fabrication of Tungsten Thin Films
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Tungsten (W) thin films were deposited on stainless steel–304 substrates using a low energy (2 kJ) plasma focus device. The samples were synthesized at various distances with respect to anode tip (7, 10 and 13 cm) and using same number of focus deposition shots (25 shots). X-ray diffraction (XRD), energy dispersive X-ray atomic force microscopy (AFM) and micro hardness were used to investigate the prepared samples. XRD analysis revealed that the degree of crystallinity of deposited thin films decrease with increasing the distance from the anode tip. AFM results showed that size of the grains on the surface of the films and the surface roughness of deposited samples constantly increase with the increasing of the axial position. Moreover, the hardness measurements revealed that the highest mechanical hardness is obtained when the film is deposited at 7 cm axial position.
KeywordsPlasma focus Thin film Tungsten XRD AFM
The authors would like to thank Iran National Science Foundation (INSF) for their interest and support of this work. Also the first author gratefully acknowledges Dr. Reza Hoseinnezhad at RMIT University, Australia, for his valuable helps.
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