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Journal of Fusion Energy

, Volume 30, Issue 6, pp 503–508 | Cite as

X-ray Emission from Argon Plasma Focus Contaminated with Copper Impurities in AECS PF-2 Using Five Channel Diode Spectrometer

  • Sh. Al-Hawat
  • M. Akel
  • C. S. Wong
Original Research

Abstract

In this work, the X-ray ratio method using different thicknesses of Al foil absorbers was used to study the influence of copper impurities on the electron temperature determination of the focused plasma in AECS PF-2 with argon filling gas. Five channels of BPX 65 PIN diodes were employed to record the X-ray pulses generated by a low energy Mather type plasma focus device energized by a 25 μF, 15 kV (2.8 kJ) capacitor bank consisting of two capacitors each with 12.5 μF capacity connected in parallel. By comparing the ratio values experimentally obtained for a series of shots at various pressures with theoretically calculated ratios for argon plasma, the X-ray emission ratio was found to correspond to the Cu–Kα line radiation for most of the discharges and only about less than 10% of the measurements give the correct expected electron temperature of 1.5–2.5 keV for the focused argon plasma.

Keywords

AECS PF-2 device X-rays Argon plasma PIN diodes detector Cu–Kα line radiation 

Notes

Acknowledgments

The authors would like to thank general director of AECS for support, guidance and encouragement. Also, many thanks to Asian African Association for Plasma Training (AAAPT) for providing a set of five channel Diode X-ray Spectrometer. M. Akel is grateful to the Plasma Research Laboratory at Physics Department of University of Malaya for hosting his 1 month attachment to enable him to learn the five channel Diode X-ray Spectrometer technique.

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Copyright information

© Springer Science+Business Media, LLC 2011

Authors and Affiliations

  1. 1.Department of PhysicsAtomic Energy CommissionDamascusSyria
  2. 2.Department of Physics, Plasma Research LaboratoryUniversity of MalayaKuala LumpurMalaysia

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