p-Type NiO thin films obtained via an electrochemical-thermal route

Abstract

The development of procedures for the synthesis of p-type NiO on top of non-degenerate semiconductors is of great interest due to the potential applications in several areas of microelectronics. In this work, p-type NiO films with different resistivity values are obtained by heating at different temperatures Ni(OH)2 layers electrodeposited on n-type monocrystalline Si substrates. Characterizations by X-ray diffraction and X-ray photoelectron spectroscopy have evidenced the phase change, from hexagonal β-Ni(OH)2 to cubic NiO for all treated samples, with improved crystallinity for higher heating temperatures. The effect of the electrochemical parameters and heat treatment temperatures on the thickness and surface morphology of the films was also analyzed by mechanical profilometry and scanning electron microscopy, respectively. The p-type behavior of the films and the electrical resistivity values were determined from electrical measurements using a two-point probe system in a sandwich configuration. Higher resistivity values were found for films subjected to higher heat treatment temperatures.

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Data availability

The data that support the findings of this study are available from the corresponding author upon reasonable request.

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Acknowledgements

The authors acknowledge the Brazilian agencies CAPES, CNPQ, and FINEP for supporting this research and the measurements in LDRX-UFSC (XRD). The authors thank also Prof. M. F. Cerqueira and Dr. Jérôme Borme from International Iberian Nanotechnology Laboratory for supporting during the SEM measurements. The authors acknowledge the measurements in LDRX-UFSC (XRD). The authors also thank Dr. Jérôme Borme from International Iberian Nanotechnology Laboratory (INL) for supporting the SEM measurements.

Funding

This research was supported by the Brazilian agencies CAPES, CNPQ, and FINEP.

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Quispe, L.T., Avila, L.B., Linhares, A.A. et al. p-Type NiO thin films obtained via an electrochemical-thermal route. J Mater Sci: Mater Electron (2021). https://doi.org/10.1007/s10854-021-05260-7

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