Journal of Materials Science: Materials in Electronics

, Volume 29, Issue 18, pp 15416–15422 | Cite as

Effect of reduction potential and post-deposition annealing on the structural, compositional and optical properties of electrodeposited copper(I) sulfide thin films

  • R. Torres-Ricárdez
  • E. Ramírez-Morales
  • L. Rojas-Blanco
  • F. I. Lizama-Tzec
  • M. F. García-Mendoza
  • J. G. Álvarez-Ramírez
  • L. L. Díaz-Flores
  • G. Pérez-Hernández


In the present work it is reported on the deposition of cuprous sulfide (Cu2S) by the electrodeposition technique and its characterization followed by a heat treatment. Cu2S films were deposited using reduction potentials in a range of − 600 to − 555 mV (vs. SCE) with a deposition time of 1000 s. The annealing process was performed varying the atmosphere (inert or with sulfur) and temperature (250 and 350 °C). The properties of deposited Cu2S films were analyzed using UV–Vis spectroscopy, X-ray diffraction, scanning electron microscopy and energy-dispersive X-ray spectroscopy. The deposited films had a hexagonal structure in the chalcocite phase and showed a band gap in the range of 1.61 and 1.8 eV. Characterization techniques demonstrated modifications in the properties of the material due to the presence or deficiency of sulfur in the films.



The authors thank M.I. Anabel González Díaz and M.C. Edith Ponce Recinos for their contribution in SEM, EDX and XRD analysis.


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Copyright information

© Springer Science+Business Media, LLC, part of Springer Nature 2018

Authors and Affiliations

  • R. Torres-Ricárdez
    • 1
  • E. Ramírez-Morales
    • 1
  • L. Rojas-Blanco
    • 1
  • F. I. Lizama-Tzec
    • 2
  • M. F. García-Mendoza
    • 1
  • J. G. Álvarez-Ramírez
    • 1
  • L. L. Díaz-Flores
    • 1
  • G. Pérez-Hernández
    • 1
  1. 1.Universidad Juárez Autónoma de TabascoVillahermosaMexico
  2. 2.Departamento de Física AplicadaCINVESTAV-IPNMeridaMexico

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