Skip to main content
SpringerLink
Log in

Effect of oblique angle on dynamic magnetic properties of FeSiAl–SiO2 thin films fabricated by oblique co-sputtering method

  • Published:
Journal of Materials Science: Materials in Electronics Aims and scope Submit manuscript

Abstract

In this work, we investigate the dynamic magnetic properties and their thermostability in the temperature range of 300 to 420 K for FeSiAl–SiO2 thin films fabricated by hybrid oblique co-sputtering technique systematically. The magnetic anisotropy field HK and ferromagnetic resonance frequency fFMR can be tuned from 14.66 to 85.32 Oe and 1.13 to 2.62 GHz respectively, by adjusting the oblique angle β, which can be elucidated with respect to the contribution of reinforced shape and stress-induced anisotropies. Moreover, the thermostability of FeSiAl–SiO2 films in terms of HK and fFMR are enhanced with the increase of β up to 35° while the thermostability of effective Gilbert damping factor αeff and the maximum imaginary permeability μ″max are enhanced with the increasing of β up to 45° and the involved mechanisms are analyzed in detail.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6

Similar content being viewed by others

References

  1. Y. Wang, B. Dai, B. Huang, Y. Ren, J. Xu, Z. Wang, S. Tan, J. Ni, J. Mater. Sci. Mater. Electron. 27, 3778 (2016)

    Article  Google Scholar 

  2. J. Zhang, M.C. Nguyen, B. Balasubramanian, B. Das, D.J. Sellmyer, Z. Zeng, K.M. Ho, C.Z. Wang, J. Phys. D Appl. Phys. 49, 175002 (2016)

    Article  Google Scholar 

  3. D.R. Cao, Z.T. Zhu, H.M. Feng, L.N. Pan, X.H. Cheng, Z.K. Wang, J.B. Wang, Q.F. Liu, J. Magn. Magn. Mater. 416, 208 (2016)

    Article  Google Scholar 

  4. C.T. Max, X.P. Li, J. Poon, J. Magn. Magn. Mater. 417, 197 (2016)

    Article  Google Scholar 

  5. A.J. Albaaji, E.G. Castle, M.J. Reece, J.P. Hall, S.L. Evans, J. Mater. Sci. 51, 7624 (2016)

    Article  Google Scholar 

  6. P.V. Ong, N. Kioussis, P.K. Amiri, K.L. Wang, Sci. Rep. 6, 29815 (2016)

    Article  Google Scholar 

  7. N.N. Phuoc, C.K. Ong, J. Electron. Mater. 45, 4061 (2016)

    Article  Google Scholar 

  8. S. Boyn, J. Sampaio, V. Cros, J. Grollier, A. Fukushima, H. Kubota, K. Yakushiji, S. Yuasa, Phys. Rev. B 93, 224427 (2016)

    Article  Google Scholar 

  9. G. Zahnd, V.T. Pham, A. Marty, M. Jamet, C. Beigne, L. Notin, C. Vergnaud, F. Rortais, L. Vila, J.P. Attane, J. Magn. Magn. Mater. 406, 166 (2016)

    Article  Google Scholar 

  10. M.Z. Iqbal, M.W. Iqbal, S. Siddique, M.F. Khan, S.M. Ramay, Sci. Rep. 6, 21038 (2016)

    Article  Google Scholar 

  11. X. Zhong, N.N. Phuoc, G. Chai, Y. Liu, C.K. Ong, J. Alloys Compd. 610, 126 (2014)

    Article  Google Scholar 

  12. X. Zhong, N.N. Phuoc, W.T. Soh, C.K. Ong, L. Peng, L. Li, J. Electron. Mater. (2016). doi:10.1007/s11664-016-4882-x

    Google Scholar 

  13. X. Zhong, Y. Liu, J. Li, Y. Wang, J. Magn. Magn. Mater. 324, 2631 (2012)

    Article  Google Scholar 

  14. D. Liu, C. Wu, M. Yan, J. Mater. Sci. 50, 6559 (2015)

    Article  Google Scholar 

  15. X. Fan, J. Wang, Z.Y. Wu, G.Q. Li, Mater. Sci. Eng. B Adv. 201, 79 (2015)

    Article  Google Scholar 

  16. M. Cartier, S. Auffret, P. Bayle-Guillemaud, F. Ernult, F. Fettar, B. Dieny, J. Appl. Phys. 91, 1436 (2002)

    Article  Google Scholar 

  17. I. Barsukov, P. Landeros, R. Meckenstock, J. Lindner, D. Spoddig, Z.A. Li, B. Krumme, H. Wende, D.L. Mills, M. Farle, Phys. Rev. B 85, 014420 (2012)

    Article  Google Scholar 

  18. N.N. Phuoc, C.K. Ong, J. Appl. Phys. 118, 093903 (2015)

    Article  Google Scholar 

  19. N.N. Phuoc, C.K. Ong, Adv. Mater. 25, 980 (2013)

    Article  Google Scholar 

  20. N.N. Phuoc, C.K. Ong, Appl. Phys. Lett. 102, 212406 (2013)

    Article  Google Scholar 

  21. N.N. Phuoc, C.K. Ong, J. Phys. D Appl. Phys. 46, 485002 (2013)

    Article  Google Scholar 

  22. L.T. Hung, N.N. Phuoc, X.C. Wang, C.K. Ong, Rev. Sci. Instrum. 82, 084701 (2011)

    Article  Google Scholar 

  23. R.L. Rodríguez-Suárez, L.H. Vilela-Leão, T. Bueno, A.B. Oliveira, J.R.L. de Almeida, P. Landeros, S.M. Rezende, A. Azevedo, Phys. Rev. B 83, 224418 (2011)

    Article  Google Scholar 

  24. W.T. Soh, X. Zhong, C.K. Ong, Appl. Phys. Lett. 105, 112401 (2014)

    Article  Google Scholar 

  25. E.B. Park, Y. Kim, S. Jang, J. Kim, S. Han, S. Kwon, Met. Mater. Int. 19, 129 (2013)

    Article  Google Scholar 

Download references

Acknowledgements

This work was supported by the National Natural Science Foundation of China (Grant No. 51502025) and the Scientific Research Foundation of CUIT (Grant No. KYTZ201620).

Author information

Authors and Affiliations

  1. College of Optoelectronic Technology, Chengdu University of Information Technology, Chengdu, 610225, People’s Republic of China

    Xiaoxi Zhong, Lezhong Li, Rui Wang & Xiaoqiang Tu

Authors
  1. Xiaoxi Zhong
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Lezhong Li
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Rui Wang
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Xiaoqiang Tu
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Lezhong Li.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Zhong, X., Li, L., Wang, R. et al. Effect of oblique angle on dynamic magnetic properties of FeSiAl–SiO2 thin films fabricated by oblique co-sputtering method. J Mater Sci: Mater Electron 28, 4570–4576 (2017). https://doi.org/10.1007/s10854-016-6093-x

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s10854-016-6093-x

Keywords

Search

Navigation