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Broadband near-infrared absorption enhancement in Si substrate via random distributed Ag nanoparticles

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Abstract

A broadband near-infrared (NIR) absorption from 1200 to 2500 nm in Si substrate is investigated by Ag film deposition and subsequent thermal annealing. Under thermal annealing, Ag films can crack and shrink into Ag nanoparticles (NPs). Annealing temperature greatly affects the size, distribution status and morphology of Ag NPs, resulting in different NIR absorption. The influence of the size and distribution of Ag NPs on NIR absorption originated from localized surface plasmon resonance (LSPR) is theoretically simulated by a finite difference time domain method. The band width of LSPR belongs to different type Ag NPs are discussed.

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Acknowledgments

Project supported by the National Natural Science Foundation of China (Nos. 61306125 & U1435210), the Science and Technology Innovation Project (Y3CX1SS143) of CIOMP, the Science and Technology Innovation Foundation of CAS (CXJJ-15Q071), the Science and Technology Innovation Project of Jilin Province (Nos. Y3293UM130 & 20130522147JH & 20140101176JC).

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Authors and Affiliations

  1. Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, 130033, China

    Xiaoyi Liu, Jinsong Gao & Haigui Yang

  2. University of the Chinese Academy of Sciences, Beijing, 100039, China

    Xiaoyi Liu & Jinsong Gao

Authors
  1. Xiaoyi Liu
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  2. Jinsong Gao
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  3. Haigui Yang
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Correspondence to Haigui Yang.

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Liu, X., Gao, J. & Yang, H. Broadband near-infrared absorption enhancement in Si substrate via random distributed Ag nanoparticles. J Mater Sci: Mater Electron 27, 10479–10483 (2016). https://doi.org/10.1007/s10854-016-5138-5

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  • DOI: https://doi.org/10.1007/s10854-016-5138-5

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