Electrical resistivity and magnetic properties of electrodeposited nanocrystalline CoFe thin films

  • S. Mehrizi
  • M. Heydarzadeh Sohi


Nanocrystalline CoFe thin films were electrodeposited from baths containing sodium citrate as complexing agent. Cyclic voltammogrames of CoFe baths showed that addition of sodium citrate to the electrolytes shifted reduction potential of metals toward more negative values. X-ray diffraction patterns of CoFe thin films deposited at different current densities illustrated a transition from FCC(Co) phase to FCC(Co) + BCC(Fe) phases with increasing applied current density. Estimation of average grain size (D) of CoFe thin films by Scherrer’s equation showed all coatings had nanocrystalline structures. The accuracy of results obtained by Scherrer’s equation was confirmed by transmutation electron microscope images. Study of magnetic properties by vibrating sample magnetometer indicated that reduction in grain size of CoFe films resulted in noticeable decrease in coercivity, according to “D6” law. Moreover, decreasing grain size in CoFe thin films led to reduction in resistivity which could be attributed to scattering of conduction electrons, according to “Scattering Hypotheses”. However, average grain size of nanocrystalline CoFe films had no effect on the saturation magnetization which is mostly controlled by chemical composition. The results showed that increasing iron content in the deposited CoFe films from 17 to 31 at.% caused enhancement of saturation magnetization.


Electrical Resistivity Saturation Magnetization CoFe Ferromagnetic Material Metal Hydroxide 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.



The authors would like to thank University of Tehran and Iranian nanotechnology initiative council for financial support of this research.


  1. 1.
    B. Crozier, Q. Liu, D.G. Ivey, J. Mater. Sci. Mater. Electron. 22, 614–625 (2011)CrossRefGoogle Scholar
  2. 2.
    M. Salehi, P. Marashi, M. Salehi, R. Ghannad, J. Ultrafine Grained Nanostruct. Mater. 47, 27–35 (2014)Google Scholar
  3. 3.
    A. Ghasemi, A.M. Davarpanah, M. Ghadiri, Int. J. Nanosci. Nanotechnol. 4, 207–214 (2012)Google Scholar
  4. 4.
    E.I. Cooper, C. Bonhote, J. Heidmann, Y. Hsu, P. Kern, J.W. Lam, M. Ramasubramanian, N. Robertson, L.T. Romankiw, H. Xu, IBM J. Res. Dev. 49, 103–126 (2005)CrossRefGoogle Scholar
  5. 5.
    X. Zhang, S. Wang, J. Zhou, J. Li, D. Jiao, X. Kou, J. Alloys Compd. 474, 273–278 (2009)CrossRefGoogle Scholar
  6. 6.
    W. Wanga, G.H. Yuea, Y. Chena, W.B. Mib, H.L. Baib, D.L. Peng, J. Alloys Compd. 475, 440–445 (2009)CrossRefGoogle Scholar
  7. 7.
    R.H. Yu, S. Basu, L. Ren, Y. Zhang, A. Parvizi-Majidi, K.M. Unruh, J.Q. Xiao, IEEE Trans. Magn. 36, 3388–3393 (2000)CrossRefGoogle Scholar
  8. 8.
    Z. Jamili-Shirvan, M. Haddad-Sabzevar, J. Ultrafine Grained Nanostruct. Mater. 46, 55–59 (2013)Google Scholar
  9. 9.
    S. Mehrizi, M. Heydarzadeh Sohi, S.A. Seyyed Ebrahimi, Surf. Coat. Technol. 205, 4757–4763 (2011)CrossRefGoogle Scholar
  10. 10.
    G. Herzer, IEEE Trans. Magn. 26, 1397–1402 (1990)CrossRefGoogle Scholar
  11. 11.
    Y. Zhang, D.G. Ivey, Mater. Sci. Eng. B 140, 15–22 (2007)CrossRefGoogle Scholar
  12. 12.
    M. Raghasudha, D. Ravinder, P. Veerasomaia, J. Nanostruct. Chem. 3, 63–68 (2013)Google Scholar
  13. 13.
    M. Nazari, N. Ghasemi, H. Maddah, M. Motlagh, Nanostruct. Chem. 4, 99–103 (2014)CrossRefGoogle Scholar
  14. 14.
    B. Mueller, ChemEQL, A Program to Calculate Chemical Speciation, Version 3.0. Limnological Research Center EAWAG/ETH, CH-6047 Kastanienbaum, Switzerland (1996)Google Scholar
  15. 15.
    A.E Martell, R.M. Smith, Critical Stability Constants, vols. 1, 6 (Plenum Press, London, 1974, 1989)Google Scholar
  16. 16.
    A.E. Martell, R.M. Smith, R.J. Motekaitis Critical Stability Constants Database Version 6.0. NIST (Texas A&M University, College Station, 2001)Google Scholar
  17. 17.
    A. Brenner, Electrodeposition of Alloys (Academic Press, New York, 1963)Google Scholar
  18. 18.
    H. Bakar, ASM Handbook, Alloy Phase Diagrams, vol. 3 (ASM International, Materials Park, 1992)Google Scholar
  19. 19.
    P. Wissmann, H. Ulrich Finzel, Electrical Resistivity of Thin Metal Films (Springer, Berlin, 2007)Google Scholar
  20. 20.
    S. Mehrizi, M. Heydarzadeh Sohi, E. Shafahian, A.A. Khangholi, J. Mater. Sci. Mater. Electron. 23, 1174–1396 (2012)CrossRefGoogle Scholar

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© Springer Science+Business Media New York 2015

Authors and Affiliations

  1. 1.School of Metallurgy and Materials Engineering, College of EngineeringUniversity of TehranTehranIran

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