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Electrical, optical and structural properties of rod shaped Bi2S3 thin films deposited by dip technique

  • P. A. Chate
  • S. D. Lakde
Article

Abstract

In the present paper, we have reported the room temperature growth of bismuth sulphide (Bi2S3) thin films by dip method and detailed characterization of these films. The films were deposited from a reaction bath containing bismuth nitrate, glycine and sodium thiosulphate. We have analyzed the structure, morphology, composition, optical and electrical properties of Bi2S3 thin films. X-ray diffraction pattern showed that the films were polycrystalline. From optical absorption spectra the band gap of the material is estimated to be 1.6 eV. The electrical conductivity is of the order of 10−6 (Ω cm)−1. Composition analyses by EDAX show that the films are nearly stoichiometric in composition.

Keywords

Bi2S3 Thioacetamide Bismuth Nitrate Bismuthinite Chemical Bath Deposition Method 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Notes

Acknowledgments

The author (PAC) thankfully acknowledges to Dr. D.J. Sathe (KIT) for valuable discussion during research and preparation of manuscript.

References

  1. 1.
    K. Mageshwari, R. Sathyamoorthy, Mater. Sci. Semicond. Process. 16, 43 (2013)CrossRefGoogle Scholar
  2. 2.
    B. Pejova, I. Grozdanov, Mater. Chem. Phys. 99, 39 (2006)CrossRefGoogle Scholar
  3. 3.
    R. Sathyamoorthy, P. Sudhagar, S. Chandramohan, U. Pal, J. Nanosci. Nanotechnol. 8, 6481 (2008)Google Scholar
  4. 4.
    S. Gadakh, C. Bhosale, Mater. Chem. Phys. 64, 5 (2000)CrossRefGoogle Scholar
  5. 5.
    R. Mane, B. Sankapal, C. Lokhande, Mater. Chem. Phys. 60, 196 (1999)CrossRefGoogle Scholar
  6. 6.
    G. Zhu, P. Liu, J. Zhou, X. Bian, X. Wang, J. Li, B. Chen, Mater. Lett. 62, 2335 (2008)CrossRefGoogle Scholar
  7. 7.
    C. Tang, Y. Zhang, X. Dou, G. Li, J. Cryst. Growth 312, 692 (2010)CrossRefGoogle Scholar
  8. 8.
    T. Thongtem, C. Pilapong, J. Kavinchan, A. Phuruangrat, S. Thongtem, J. Alloys Compd. 500, 195 (2010)CrossRefGoogle Scholar
  9. 9.
    P. Kumar, N. Jain, R. Agarwal, Chalcogen. Lett. 7, 89 (2010)Google Scholar
  10. 10.
    C. Tang, G. Wang, H. Wang, Y. Zhang, G. Li, Mater. Lett. 62, 3663 (2008)CrossRefGoogle Scholar
  11. 11.
    C. Falcony, M. Garcia, A. Ortiz, J.C. Alonso, J. Appl. Phys. 72, 1525 (1992)CrossRefGoogle Scholar
  12. 12.
    Y. Lu, J. Jia, G. Yi, Cryst. Eng. Comm. 14, 3433 (2012)CrossRefGoogle Scholar
  13. 13.
    K. Mageshwari, R. Sathyamoorthy, P. Sudhagar, Y. Kang, Appl. Surf. Sci. 257, 7245 (2011)CrossRefGoogle Scholar
  14. 14.
    S. Liufu, L. Chen, Q. Yao, C. Wang, Appl. Phys. Lett. 90, 112106 (2007)CrossRefGoogle Scholar
  15. 15.
    F. Gao, Q. Lu, S. Komarneni, Chem. Commun. 4, 531 (2005)CrossRefGoogle Scholar
  16. 16.
    Z. Liu, S. Peng, Q. Xie, Z. Hu, Y. Yang, S. Zhang, Y. Qian, Adv. Mater. 15, 936 (2003)CrossRefGoogle Scholar
  17. 17.
    R. Malakooti, L. Cademartiri, Y. Akçakir, S. Petrov, A. Migliori, G. Ozin, Adv. Mater. 18, 2189 (2006)CrossRefGoogle Scholar
  18. 18.
    C. Ye, G. Meng, Z. Jiang, Y. Wang, G. Wang, L. Zhang, J. Am. Chem. Soc. 124, 15180 (2002)CrossRefGoogle Scholar
  19. 19.
    M. Sigman, B. Korgel, Chem. Mater. 17, 1655 (2005)CrossRefGoogle Scholar
  20. 20.
    L. Cademartiri, R. Malakooti, P. O’Brien, A. Migliori, S. Petrov, N. Kherani, G. Ozin, Angew. Chem. Int. 47, 3814 (2008)CrossRefGoogle Scholar
  21. 21.
    L. Li, N. Sun, Y. Huang, Y. Qin, N. Zhao, J. Gao, M. Li, H. Zhou, L. Qi, Adv. Funct. Mater. 18, 1194 (2008)CrossRefGoogle Scholar
  22. 22.
    J. Tang, A. Alivisatos, Nano Lett. 6, 2701 (2006)CrossRefGoogle Scholar
  23. 23.
    Q. Lu, F. Gao, S. Komarneni, J. Am. Chem. Soc. 126, 54 (2004)CrossRefGoogle Scholar
  24. 24.
    J. Jiang, S. Yu, W. Yao, H. Ge, G. Zhang, Chem. Mater. 17, 6094 (2005)CrossRefGoogle Scholar
  25. 25.
    G. Nie, X. Lu, J. Lei, L. Yang, C. Wang, Electro. Acta 154, 24 (2015)CrossRefGoogle Scholar
  26. 26.
    A. Begum, A. Hussain, A. Rahman, Chalcogen. Lett. 8, 283 (2011)Google Scholar
  27. 27.
    A. Ubale, S. Shirbhate, J. Alloys Compd. 497, 228 (2010)CrossRefGoogle Scholar
  28. 28.
    S. Gadakh, C. Bhosale, Mater. Res. Bull. 35, 1097 (2000)CrossRefGoogle Scholar
  29. 29.
    R. Ahire, B. Sankapal, C. Lokhande, Mater. Res. Bull. 36, 199 (2001)CrossRefGoogle Scholar
  30. 30.
    K. Mageshwari, R. Sathyamoorthy, Vacuum 86, 2029 (2012)CrossRefGoogle Scholar
  31. 31.
    P. Rajalakshmi, R. Oommen, R. Oommen, C. Sanjeeviraja, Chalcogen. Lett. 8, 683 (2011)Google Scholar
  32. 32.
    V. Killedar, S. Katore, C. Bhosale, Mater. Chem. Phys. 64, 166 (2000)CrossRefGoogle Scholar
  33. 33.
    R. Mane, B. Sankapal, C. Lokhande, Mater. Chem. Phys. 60, 158 (1999)CrossRefGoogle Scholar
  34. 34.
    S. Biswas, A. Mandal, D. Mukharjee, P. Pramanik, J. Electrochem. Soc. 133, 48 (1996)CrossRefGoogle Scholar
  35. 35.
    R. He, X. Qian, J. Yin, Z. Zhu, J. Cryst. Growth 252, 505 (2003)CrossRefGoogle Scholar
  36. 36.
    X. Liu, J. Cui, L. Zhang, W. Yu, F. Guo, Y. Qian, Nanotechnology 16, 1771 (2005)CrossRefGoogle Scholar
  37. 37.
    S. Prabahar, M. Dhanam, J. Cryst. Growth 285, 41 (2005)CrossRefGoogle Scholar
  38. 38.
    J. Wang, Y. Li, Mater. Chem. Phys. 87, 420 (2004)CrossRefGoogle Scholar
  39. 39.
    B. Cullity, Elements of X-ray diffraction (Wesly, USA, 1956)Google Scholar
  40. 40.
    P. Chate, D. Sathe, P. Hankare, U. Sankpal, J. Mater. Sci.: Mater. Electron. 24, 2000 (2013)Google Scholar
  41. 41.
    D. Richards, R. Angelis, M. Kramer, J. House, D. Cunard, D. Shea, Adv. X-ray Anal. 47, 354 (2004)Google Scholar
  42. 42.
    S. Hake, P. Chate, D. Sathe, P. Hankare, V. Bhuse, J. Mater. Sci.: Mater. Electron. 25, 811 (2014)Google Scholar
  43. 43.
    P. Rajlakshmi, R. Oommen, C. Sanjeeviraja, Chalcogen. Lett. 8, 623 (2011)Google Scholar
  44. 44.
    R. Mane, B. Sankapal, C. Lokhande, Mater. Res. Bull. 35, 587 (2000)CrossRefGoogle Scholar
  45. 45.
    R. Brindha, K. Devi, Int. J. Chemtech. Res. 6, 5632 (2014)Google Scholar
  46. 46.
    R. Mane, B. Sankpal, C. Lokhande, Thin Solid Films 359, 136 (2000)CrossRefGoogle Scholar
  47. 47.
    E. Masumdar, V. Gaikwad, V. Pujari, P. More, L. Deshmukh, Mater. Chem. Phys. 77, 669 (2002)CrossRefGoogle Scholar
  48. 48.
    S. Erat, H. Metina, M. Ari, Mater. Chem. Phys. 111, 114 (2008)CrossRefGoogle Scholar
  49. 49.
    A. Khomane, Alloys Compd 506, 849 (2010)CrossRefGoogle Scholar

Copyright information

© Springer Science+Business Media New York 2015

Authors and Affiliations

  1. 1.Department of ChemistryJ.S.M. CollegeAlibagIndia
  2. 2.JJT UniversityJhunjhunuIndia
  3. 3.Bhausaheb Nene CollegePenIndia

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