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Influence of deposition potential on the electrodeposited Ternary CoFeCu films

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Abstract

Ternary CoFeCu films, relating their magnetic and magnetoresistance properties with film composition, surface morphology and the corresponding crystal structure, were investigated in terms of different deposition potentials in electrodeposition. The films were grown on polycrystalline titanium substrates. The potentials were obtained from cyclic voltammetry and the current–time transients were also recorded to control the growth of proper films. From the structural analysis by X-ray diffraction, all films had a face-centred cubic structure and the calculated grain size increased with increasing deposition potential. The film compositions by energy dispersive X-ray spectroscopy revealed that the Co, Fe and Cu contents varied and the scanning electron microscope images disclosed that the film morphologies changed as the deposition potential changed. The saturation magnetization was high and coercivity was low at high deposition potential. The easy axis of magnetization was parallel to the film plane for all films. All films showed anisotropic magnetic resistance and their magnitudes were between 3.2 and 3.8 %. The variations in magnetic and magnetoresistive properties related to the microstructure were attributed to the variation of the film contents caused by deposition potential.

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Acknowledgments

This work was supported by Balikesir University Research Grant no. BAP 2008/05. The authors would like to thank State Planning Organisation, Turkey under Grant no 2005K120170 for VSM system, Scientific and Technical Research Council of Turkey (TUBITAK) under Grant no TBAG–1771 for electrodeposition system and Balikesir University, Turkey under Grant no BAP 2001/0 2 and BAP 2005/18 for MR system. Thanks also go to Dr. H. Guler, Balikesir University, Chemistry Department, Turkey for XRD measurements and Anadolu University, Department of Materials Science and Engineering, Turkey, for SEM-EDX measurements.

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Authors and Affiliations

  1. Physics Department, Science and Literature Faculty, Balikesir University, 10145, Cagis, Balikesir, Turkey

    Hakan Kockar, Ercument Ozergin & Oznur Karaagac

  2. Physics Department, Science and Literature Faculty, Uludag University, 16059, Gorukle, Bursa, Turkey

    Mursel Alper

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  1. Hakan Kockar
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  2. Ercument Ozergin
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  3. Oznur Karaagac
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  4. Mursel Alper
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Correspondence to Hakan Kockar.

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Kockar, H., Ozergin, E., Karaagac, O. et al. Influence of deposition potential on the electrodeposited Ternary CoFeCu films. J Mater Sci: Mater Electron 24, 2562–2567 (2013). https://doi.org/10.1007/s10854-013-1134-1

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  • DOI: https://doi.org/10.1007/s10854-013-1134-1

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