Effect of substrate temperature on structural, morphological and optical properties of crystalline titanium dioxide films prepared by DC reactive magnetron sputtering
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Titanium dioxide (TiO2) thin films have been deposited with various substrate temperatures by dc reactive magnetron sputtering method onto glass substrate. The effects of substrate temperature on the crystallization behavior and optical properties of the films have been studied. Chemical composition of the films was investigated by X-ray photoelectron spectroscopy (XPS). X-ray diffraction (XRD) analysis of the films revealed that they have polycrystalline tetragonal structure with strong (101) texture. The surface morphological study revealed the crystalline nature of the films at higher substrate temperatures. The TiO2 films show the main bands in the range 400–700 cm−1, which are attributed to Ti–O stretching and Ti–O–Ti bridging. The transmittance spectra of the TiO2 thin film measured with various substrate temperatures ranged from 75 to 90 % in the visible light region. The optical band gap values of the films are increasing from 3.44 to 4.0 eV at growth temperature from 100 to 400 °C. The structural and optical properties of the films improved with the increase in the deposition temperature.
KeywordsTiO2 Rutile Substrate Temperature Deposition Temperature TiO2 Film
One of the authors (B.S) thanks the Department of Science & Technology, New Delhi, for a research grant under SERC scheme No SR/S1/PC/31/2008.