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The effect of post-annealing under CdCl2 atmosphere on the properties of ITO thin films deposited by DC magnetron sputtering

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Abstract

Indium tin oxide (ITO) films deposited by DC magnetron sputtering were annealed under CdCl2 atmosphere at different temperatures. The effects of CdCl2 heat-treatment on the structural, electrical and optical properties of the films were investigated. The X-ray diffraction measurement proves the annealing results in a change of preferred orientation from (400) to (222). It is found the resistivity increases from 1.49 × 10−4 Ω cm of the as-deposited film to 6.82 × 10−4 Ω cm of the film annealed at 420 °C. The optical energy gap for the film varies from 3.97 to 3.89 eV. It is also found that the CdCl2 heat-treatment results in narrowing the energy gap of ITO film.

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References

  1. C. Lee, R.P. Dwivedi, W. Lee, C. Hong, W.I. Lee, H.W. Kim, J. Mater. Sci. Mater. Electron. 19, 981 (2008). doi:10.1007/s10854-007-9430-2

    Article  CAS  Google Scholar 

  2. A.N. Tiwari, A. Romeo, D. Baetzner, H. Zogg, Prog. Photovolt: Res. Appl. 9, 211–215 (2001). doi:10.1002/pip.374

    Article  CAS  Google Scholar 

  3. J. Herrero, C. Guillén, Vacuum 67, 611 (2002). doi:10.1016/S0042-207X(02)00261-0

    Article  CAS  Google Scholar 

  4. D. Kim, S. Kim, Surf. Coat. Technol. 176, 23 (2003). doi:10.1016/S0257-8972(03)00514-0

    Article  CAS  Google Scholar 

  5. J. Fritsche, T. Schulmeyer, A. Thißen, A. Klein, W. Jaegermann, Thin Solid Films 431–432, (2003) doi:10.1016/S0040-6090(03)00269-4 (267–271)

  6. F.H. Seymour, V. Kaydanov, T.R. Ohno, D. Albin, Appl. Phys. Lett. 87, 153507 (2005). doi:10.1063/1.2099515

    Article  ADS  Google Scholar 

  7. P.R. Edwardsa, K. Durosea, J. Beierb, M. Campob, D. Bonnetb, Thin Solid Films. 387, 189–191 (2001). doi:10.1016/S0040-6090(00)01706-5

    Article  ADS  Google Scholar 

  8. Joint Committee on Power Diffraction Standards (JCPDS), Card No. 06-0416

  9. E. Terzini, P. Thilakan, C. Minarini, Mater. Sci. Eng. B 77, 110 (2000). doi:10.1016/S0921-5107(00)00477-3

    Article  Google Scholar 

  10. C.G. Choi, K. No, W. Lee, H. Kim, S.O. Jung, W.J. Lee, W.S. Kim, S.J. Kim, C. Yoon, Thin Solid Films 258, 274–278 (1995). doi:10.1016/0040-6090(94)06354-0

    Article  CAS  ADS  Google Scholar 

  11. A.M. Gheidari, F. Behafarid, G. Kavei, M. Kazemzad, Mater. Sci. Eng. B 136, 37–40 (2007). doi:10.1016/j.mseb.2006.08.058

    Article  CAS  Google Scholar 

  12. R.B.H. Tahar, T. Ban, Y. Ohya, Y. Takahashi, J. Appl. Phys. 83, 2631 (1998). doi:10.1063/1.367025

    Article  ADS  Google Scholar 

  13. H.N. Cui, V. Teixeira, L.J. Meng, E. Fortunato, Proc. of SPIE 6034, 603407 (2006). doi:10.1117/12.668090

    Article  Google Scholar 

  14. S.A. Knickerbocker, A.K. Kulkarni, J. Vac. Sci. Technol. A 14, 757–761 (1996). doi:10.1116/1.580384

    Article  CAS  ADS  Google Scholar 

  15. S. Ray, R. Banerjee, N. Basu, A.K. Batabyal, A.K. Barua, J. Appl. Phys. 54, 3497 (1983). doi:10.1063/1.332415

    Article  CAS  ADS  Google Scholar 

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Acknowledgments

The authors gratefully acknowledge the Chinese Ministry of Science and Technology for financial support under construct 2003AA513010.

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Authors and Affiliations

  1. College of Materials Science and Engineering, Sichuan University, Chengdu, 610064, People’s Republic of China

    Shenghao Wang, Jingquan Zhang, Bo Wang, Lianghuan Feng, Yaping Cai, Lili Wu, Wei Li, Zhi Lei & Bing Li

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  1. Shenghao Wang
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Correspondence to Jingquan Zhang.

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Wang, S., Zhang, J., Wang, B. et al. The effect of post-annealing under CdCl2 atmosphere on the properties of ITO thin films deposited by DC magnetron sputtering. J Mater Sci: Mater Electron 21, 441–444 (2010). https://doi.org/10.1007/s10854-009-9932-1

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