Effect of post annealing on structural and optical properties of ZnO thin films deposited by vacuum coating technique
We report the effect of annealing temperature on structural, electrical and optical properties of polycrystalline zinc oxide thin films grown on p-type silicon (100) and glass substrates by vacuum coating technique. The XRD and AFM measurements confirmed that the thin films grown by this technique have good crystalline hexagonal wurtzite structures and homogenous surfaces. The study also reveals that the rms value of thin film roughness increases from 6 to 16 nm, the optical band gap increases from 3.05 to 3.26 eV and resistivity from 0.3 to 5 Ωcm when the post-deposition annealing temperature is changed from 400 to 600 °C. It is observed that ZnO thin film annealed at 600 °C after deposition provide a smooth and flat texture suited for optoelectronic applications.
KeywordsAtomic Force Microscope Atomic Force Microscope Image Post Deposition Annealing Sheet Resistivity Thin Film Layer
The authors wish to thank Prof. D. Pandey, School of Materials Science and Technology, Institute of Technology, Banaras Hindu University, Varanasi, India, for helpful discussions.
- 16.K.S. KIM, H.W. KIM, J. Korean. Physical. Soc. 42, S149 (2003)Google Scholar