Abstract
There are many types of non-volatile memory devices but they are generally constructed from silicon. With the development of transparent organic thin film transistors, there is a need to also develop memory devices to allow the complete integration of digital circuitries. The aim of this research is to develop a fabrication route of an all-solution processing of optically transparent organic field effect transistor-based non-volatile memory (OFET-NVM). The OFET-NVMs can be programmed and erased at a relatively low voltage (±15 V). The OFET-NVM has a charge mobility of 0.125 cm2/V-s, threshold voltage shift of approximately 3 V between programmed and erased transistor and a sub-threshold slope of 1.5 V/decade. Although these figure-of-merits are not comparable to its silicon counterpart, the creation of an all solution processed OFET-NVM that is optically transparent (~70–85%) has been demonstrated.
Similar content being viewed by others
References
P. Pavan, R. Bez, P. Olivo, E. Zanoni, in Proceedings of the IEEE, vol. 85 (1997), pp. 1248–1271
A. Sawa, Mater. Today. 11(6), 28–36 (2008). doi:10.1016/S1369-7021(08)70119-6
W. Welnic, M. Wuttig, Mater. Today. 11(6), 20–27 (2008). doi:10.1016/S1369-7021(08)70118-4
J. Jo, T.-M. Lee, J.-S. Yu, C.-H. Kim, D.-S. Kim, E.-S. Lee, M. Esashi, Sens. Mater. 19, 487–496 (2007)
C.D. Dimitrakopoulos, D.J. Mascaro, IBM J. Res. Develop. 45, 11–27 (2001)
P. Liu, Y. Wu, Y. Li, B.S. Ong, S. Zhu, J. Am. Chem. Soc. 128, 4554–4555 (2006). doi:10.1021/ja060620l
T.P. Alexander, T.J. Bukowski, G. Teowee, D.R. Uhlmann, K.C. McCarthy, J. Dawley, B.J.J. Zelinski, in Proceedings of the IEEE International Symposium on Applications of Ferroelectrics, vol. 2 (1996), pp. 585–588
Q. Yu, H. Yang, W. Fu, L. Chang, J. Xu, C. Yu, R. Wei, K. Du, H. Zhu, M. Li, G. Zou, Thin. Solid. Films. 515, 3840–3843 (2007). doi:10.1016/j.tsf.2006.10.077
G. He, J.H, Cai, G, Ni, Mater. Chem. Phys. 110, 110–114 (2008). doi:10.1016/j.matchemphys.2008.01.023
A. Afzali, C.D. Dimitrakopoulos, T.L. Breen, J. Am. Chem. Soc. 124, 8812–8813 (2002). doi:10.1021/ja0266621
K.D. Schroder, Advanced MOS devices. (Addison-Wesley, 1987)
E. Orgiua, I. Manunzaa, M. Sannaa, P. Cosseddua, A. Bonfiglioa, Thin. Solid. Films. 516, 1533–1573 (2008). doi:10.1016/j.tsf.2007.03.157
X.-H. Zhang, S.M. Lee, B. Domercq, B. Kippelen, Appl. Phys. Lett. 92, 243307 (2008). doi:10.1063/1.2940232
T. Cahyahi, J.N. Tey, S.G. Mhaisalkar, F. Boey, V.R. Rao, R. Lal, Z.H. Huang, G.J. Qi, Z.-K. Chen, C.M. Ng, Appl. Phys. Lett. 90, 122112 (2007). doi:10.1063/1.2715030
S.K. Park, T.N. Jackson, J.E. Anthony, D.A. Mourey, Appl. Phys. Lett. 91, 063514 (2007). doi:10.1063/1.2768934
A. Facchetti, J. Sanghyun, D. Janes, B. Jones, M. Wasielewski, T.J. Marks, Proceeding of Flexible Electronics and Displays Conference and Exhibition, (2008) pp. 1–7
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Wu, T., Aw, K.C., Tjitra Salim, N. et al. Sol–gel ZnO in organic transistor-based non-volatile memory. J Mater Sci: Mater Electron 21, 125–129 (2010). https://doi.org/10.1007/s10854-009-9879-2
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10854-009-9879-2