Structural, optoelectronic and electrochemical properties of nickel oxide films

  • B. Subramanian
  • M. Mohammed Ibrahim
  • K. R. Murali
  • V. S. Vidhya
  • C. Sanjeeviraja
  • M. Jayachandran


Thin nickel oxide (NiO) films were deposited by the electron beam evaporation technique. The films were post annealed in air at 450–500 °C for 5 h and the effect of annealing on the structural, microstructural, electrical and optical properties were studied. X-ray diffraction studies indicated the polycrystalline nature of the films. The microstructural parameters were evaluated. The band gap of the films was found to be about 3.60 eV. Electrical resistivity of the films was 4.5 × 10−4 Ω cm. FTIR studies indicated a broad spectrum centered at 461.6 cm−1. Cyclic voltammetry studies in 1 M KOH solution revealed good electronic electrochromic behaviour.


Nickel Oxide Oxygen Evolution Reaction Electrochromic Property Electrochromic Material Thermal Absorber 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


  1. 1.
    S.A. Mohammed, A.A. Atel, H. Kamal, K. Abdal-Hady, Physica B 311, 366 (2002)CrossRefADSGoogle Scholar
  2. 2.
    J.D. Desai, S.K. Min, K.-D. Jung, O.-S. Joo, Appl. Surf. Sci. 253, 1781 (2006)CrossRefADSGoogle Scholar
  3. 3.
    M. Kitao, K. Izawa, K. Urabe, T. Komatsu, S. Kuwano, S. Yamada, Jpn. J. Appl. Phys. 33, 6656 (1994)CrossRefADSGoogle Scholar
  4. 4.
    H.Y. Ryu, G.P. Choi, W.S. Lee, J.S. Park, J. Mater. Sci. Lett. 39, 4375 (2004)ADSGoogle Scholar
  5. 5.
    B. Sasi, K.G. Gopachandran, P.K. Manoj, P. Koshy, P. Prabhakara Rao, V.K. Vaidyan, Vacuum 68, 211 (2002)CrossRefGoogle Scholar
  6. 6.
    A. Agarwal, H.R. Habibi, R.K. Agarwal, J.P. Cronin, D.M. Roberts, C.P. R’Sue, C.M. Lampert, Thin Solid Films 221, 239 (1992)CrossRefADSGoogle Scholar
  7. 7.
    M.A. Vidales-Hurtado, A. Mendoza-Galvan, Mater. Chem. Phys. 107, 33 (2008)CrossRefGoogle Scholar
  8. 8.
    R.C. Korosec, P. Bukovec, Acta Chim. Slo. 53, 136 (2006)Google Scholar
  9. 9.
    M. Tanaka, M. Mukai, Y. Fujimori, M. Kondoh, Y. Tasaka, H. Baba, S. Usami, Thin Solid Films 281–282, 453 (1996)CrossRefGoogle Scholar
  10. 10.
    E. Fujii, A. Tomozawa, S. Fujii, H. Torii, M. Hattori, R. Takayama, Jpn. J. Appl. Phys. 32, L1448 (1993)CrossRefADSGoogle Scholar
  11. 11.
    I. Hotovy, D. Buc, S. Hascik, O. Nennewitz, Vacuum 50, 41 (1998)CrossRefGoogle Scholar
  12. 12.
    H. Suto, T. Minami, S. Takata, T. Yamada, Thin Solid Films 236, 27 (1993)CrossRefADSGoogle Scholar
  13. 13.
    P. Puspharajah, S. Radhakrishna, A.K. Aroif, J. Mater. Sci. 32, 3001 (1997)CrossRefGoogle Scholar
  14. 14.
    O. Kohmoto, H. Nakagawa, F. Ono, A. Chayahara, J. Magn. Magn. Mater. 226–230, 1627 (2001)CrossRefGoogle Scholar
  15. 15.
    Y.M. Lu, W.S. Hwang, J.S. Yang, Surf. Coat. Technol. 155, 231 (2002)Google Scholar
  16. 16.
    H.L. Chen, Y.M. Lu, W.S. Hwang, Surf. Coat. Technol. 198, 138 (2005)CrossRefGoogle Scholar
  17. 17.
    H.L. Chen, Y.M. Lu, W.S. Hwang, Thin Solid Films 514, 361 (2006)CrossRefADSGoogle Scholar
  18. 18.
    H.L. Chen, Y. Sheng Yang, Thin Solid Films 516, 5590 (2007)CrossRefADSGoogle Scholar
  19. 19.
    R.C. Korosec, P. Bukovec, B. Pilhar, A. Surca Vuk, B. Orel, G. Drazic, Solid State Ionics 165, 191 (2003)CrossRefGoogle Scholar
  20. 20.
    A. Azena, L. Kullman, G. Vaivars, H. Nardberg, C.G. Granquist, Solid State Ionics 113, 449 (1988)CrossRefGoogle Scholar
  21. 21.
    J. Hugal, M. Kamal, J. Phys. Condens. Mater. 9, 647 (1997)CrossRefADSGoogle Scholar
  22. 22.
    E. Iguchi, K. Akashi, J. Phys. Soc. Jpn. 61, 3385 (1992)CrossRefADSGoogle Scholar
  23. 23.
    J.I. Garcia Miquel, Q. Zhang, S.J. Allen, A. Rougier, A. Blyc, H.O. Davies, A.C. Jones, T.J. Leedham, P. Williams, S.A. Impey, Thin Solid Films 434, 165 (2003)CrossRefGoogle Scholar

Copyright information

© Springer Science+Business Media, LLC 2008

Authors and Affiliations

  • B. Subramanian
    • 1
  • M. Mohammed Ibrahim
    • 2
  • K. R. Murali
    • 1
  • V. S. Vidhya
    • 1
  • C. Sanjeeviraja
    • 3
  • M. Jayachandran
    • 1
  1. 1.Electrochemical Materials Science DivisionCentral Electrochemical Research InstituteKaraikudiIndia
  2. 2.Birla Institute of Technology and Science (BITS)-PilaniDubaiUAE
  3. 3.School of PhysicsAlagappa UniversityKaraikudiIndia

Personalised recommendations