The recent advances of research on p-type ZnO thin film

  • L. P. Dai
  • H. Deng
  • F. Y. Mao
  • J. D. Zang


ZnO is a direct wide-band gap (3.37 eV) compound semiconductor with large exciton binding energy (60 meV) at room temperature. Therefore it has a strong potential for various short-wavelength optoelectronic device, and now attracts tremendous renew interests for developing highly efficient ZnO-based optoelectronic devices. While high quality ZnO p–n junction materials obtained is the key step of its optoelectronic application. Whereas ZnO thin film is naturally only n-type conductivity due to a large number of native defects, such as oxygen vacancies and zinc interstitials, which lead to difficulty in achieving p-type ZnO thin film. Therefore the fabrication of p-type ZnO thin film has been a key and hotspot of the research on ZnO. This article summarizes the recent advances of the studies on p-type ZnO thin film and the correlative several important breakthroughs in ZnO homo-junction devices based on succeeding on fabrication of p-type ZnO film. Although the achievement obtained as summarized, there is also a long way from the real application of ZnO-based optoelectronic device. We here also discuss the problem and relevant possible solution for the fabrication of p-type ZnO film and its optoelectronic application. And forecast the preparation trends of p-type ZnO thin film.


Hole Carrier Concentration Shallow Acceptor Level Codoping Method Repeated Temperature Modulation 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.



The authors wish to thank the financial supports from Chinese Nature Science Fundamental Committee (Grant No: 60390073), Sichuan Fundamental Application Research Project (Grant No: YJ0290681) and the State Key Development Program for Basic Research of China (Grant No: ZJ0508).


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Copyright information

© Springer Science+Business Media, LLC 2007

Authors and Affiliations

  1. 1.State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronics and Solid State ElectronicsUniversity of Electronic Science and Technology of ChinaChengduP.R. China

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