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Patterned porous silicon formed with photolithography

  • M. Ohmukai
  • K. Okada
  • Y. Tsutsumi
Article

Abstract

Porous silicon is a fascinating light-emitting material among silicon-related materials. We have challenged to form a patterned porous silicon layer for the purpose of the micro optical devices with the help of photolithography. Photoresist has been used as a mask that prevented the formation of porous silicon. We achieved square patterned porous silicon with a precision of 30 μm. We also found a problem that the formation of porous silicon also proceeded under the mask partly.

Keywords

Silicon Electronic Material Porous Silicon Silicon Layer Porous Silicon Layer 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Science + Business Media, Inc. 2005

Authors and Affiliations

  • M. Ohmukai
    • 1
  • K. Okada
    • 1
  • Y. Tsutsumi
    • 1
  1. 1.Department of Electrical EngineeringAkashi College of TechnologyHyogoJapan

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