Patterned porous silicon formed with photolithography

  • M. Ohmukai
  • K. Okada
  • Y. Tsutsumi


Porous silicon is a fascinating light-emitting material among silicon-related materials. We have challenged to form a patterned porous silicon layer for the purpose of the micro optical devices with the help of photolithography. Photoresist has been used as a mask that prevented the formation of porous silicon. We achieved square patterned porous silicon with a precision of 30 μm. We also found a problem that the formation of porous silicon also proceeded under the mask partly.


Silicon Electronic Material Porous Silicon Silicon Layer Porous Silicon Layer 
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Copyright information

© Springer Science + Business Media, Inc. 2005

Authors and Affiliations

  • M. Ohmukai
    • 1
  • K. Okada
    • 1
  • Y. Tsutsumi
    • 1
  1. 1.Department of Electrical EngineeringAkashi College of TechnologyHyogoJapan

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