Journal of Materials Science

, 46:7588 | Cite as

Influence of sputtering pressure on the structure and ionic conductivity of thin film amorphous electrolyte

  • Zongqian Hu
  • Kai Xie
  • Di Wei
  • Najeeb Ullah


Ionic conducting thin film amorphous electrolytes are promising candidates for microelectronics applications. This study presents an investigation into the structure and composition of lithium phosphorus oxynitride (LiPON) thin film electrolyte prepared using radio frequency (RF) sputtering on Li3PO4 target. The ionic conductivity of LiPON thin films has been dramatically improved by decreasing N2 pressure. X-ray photoelectron spectra (XPS) were used to determine the structure and composition of LiPON thin films. It was found that increasing the N2 pressure during the deposition process resulted in a greatly decreased formation of triply coordinated –N<(Nt) as compared to doubly coordinated –N=(Nd) in LiPON thin films. These results indicate that the Nt structural unit plays an important role in the improvement of ionic conductivity as compared to the Nd structural unit. It also shows that PO2N2 tetrahedra with two Nt structural units exist in LiPON thin films at low N2 pressures. Consequently, the improved ionic conductivity of the LiPON thin film deposited at low pressure results from the existence of PO2N2 tetrahedra with two Nt structural units in LiPON thin film. PO2N2 tetrahedra with two Nt structural units provides higher cross-linking density of the glass network and lower electrostatic energy than with two Nd structural units.


Ionic Conductivity Glass Network Maximum Ionic Conductivity Thin Film Electrolyte LiPON Thin Film 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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Copyright information

© Springer Science+Business Media, LLC 2011

Authors and Affiliations

  1. 1.School of Aerospace and Materials EngineeringNational University of Defense TechnologyChangshaPeople’s Republic of China
  2. 2.Department of Materials Science and MetallurgyUniversity of CambridgeCambridgeUK
  3. 3.Nokia Research CentreCambridgeUK

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