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Thickness-induced crystallization of amorphous In2O3 films: influence of the film deposition rate

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  1. Graduate School of Human and Environmental Studies, Kyoto University, Yoshida-nihonmatsu-cho, Sakyo-ku, Kyoto, 606-8501, Japan

    S. Muranaka & N. Hayashi

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  1. S. Muranaka
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  2. N. Hayashi
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Correspondence to N. Hayashi.

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Muranaka, S., Hayashi, N. Thickness-induced crystallization of amorphous In2O3 films: influence of the film deposition rate. J Mater Sci 44, 3315–3318 (2009). https://doi.org/10.1007/s10853-008-3172-2

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  • DOI: https://doi.org/10.1007/s10853-008-3172-2

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