Abstract
Sol–gel processed photosensitive hybrid organic–inorganic films, deposited from 2-(3,4-epoxycyclohexylethyltrimethoxysilane) (EETMOS), have been studied. EETMOS sols have been optimized with respect to several criteria that guarantee a good quality, photosensitivity, and reproducibility of derived films. Photo-sensitivity of EETMOS-based films has been assessed by UVA exposure experiments. Optimized films have been photo-patterned using a mercury lamp or a He–Cd laser source, both emitting in the UVA spectral range. Promising micronic size motives have been laser patterned. The quality of derived motives is discussed with respect to photopolymerization mechanisms and photo-patterning parameters.
Similar content being viewed by others
References
Dunn B, Mackenzie JD, Zink JI, Stafsudd OM (1990) SPIE Proc 1328:174. doi:https://doi.org/10.1117/12.22557
Schmidt H, Krug H, Kasemann R, Tiefensee F (1991) SPIE Proc 1590:36. doi:https://doi.org/10.1117/12.50199
Krug H, Schmidt H (1994) N J Chem 18(10):1125
Coudray P, Chisham J, Malek-Tabrizi A, Li CY, Andrews MP, Peyghambarian N et al (1996) Opt Commun 128:19. doi:https://doi.org/10.1016/0030-4018(96)00101-0
Ou DL, Adamjee A, Lana SL, Seddon AB (1996) Surf Coat Int 11:496
Coudray P, Chisham J, Andrews MP, Najafi SI (1997) Opt Eng 36(4):1234. doi:https://doi.org/10.1117/1.601243
Etienne P, Coudray P, Moreau Y, Porque J (1998) J Sol–Gel Sci Tech 13:523
Innocenzi P, Martucci A, Guglielmi M, Armelao L, Pelli S, Righini GC et al (1999) J Non-Cryst Sol 259:182
Park OH, Jung JI, Bae BS (2001) J Mater Res 16(17):2143. doi:https://doi.org/10.1557/JMR.2001.0292
Soppera O, Croutxé-Barghorn C, Lougnot DJ (2001) N J Chem 25:1006. doi:https://doi.org/10.1039/b102317a
Croutxé-Barghorn C, Soppera O, Chevalier M (2003) Macromol Mater Eng 288:219. doi:https://doi.org/10.1002/mame.200390020
Saravanamuttu K, Blanford CF, Sharp DN, Dedman ER, Turberfield AJ, Denning RG (2003) Chem Mater 15:2301. doi:https://doi.org/10.1021/cm034015i
Trejo-Valdez M, Jenouvrier P, Fick J, Langlet M (2004) J Mater Sci 39:2801. doi:https://doi.org/10.1023/B:JMSC.0000021457.85382.1c
Zhang X, Lu H, Soutar AM, Zeng X (2004) J Mater Chem 14:357. doi:https://doi.org/10.1039/b310309a
Soppera O, Moreira PJ, Leite AP, Marques PVS (2005) J Sol–Gel Sci Tech 35:27
Decker C (1998) Polym Int 45:133. doi :10.1002/(SICI)1097-0126(199802)45:2<133::AID-PI969>3.0.CO;2-F
Decker C, Nguyen Thi Viet T, Le Xuan H (1996) Eur Polym J 32:1319. doi:https://doi.org/10.1016/S0014-3057(96)00058-4
Rajaraman SK, Mowers WA, Crivello JV (1999) J Polym Sci Part Polym Chem 37:4007. doi :10.1002/(SICI)1099-0518(19991101)37:21<4007::AID-POLA15>3.0.CO;2-8
Crivello JV (2002) Radiat Phys Chem 63:21. doi:https://doi.org/10.1016/S0969-806X(01)00476-5
Cheng X, Jay Guo L, Fu PF (2005) Adv Mater 17:1419. doi:https://doi.org/10.1002/adma.200401192
Brusatin G, Della Giustina G, Guglielmi M, Innocenzi P (2006) Prog Solid State Chem 34:223. doi:https://doi.org/10.1016/j.progsolidstchem.2005.11.005
Brusatin G, Della Giustina G, Romanoto F, Guglielmi M (2008) Nanotechnique 19:1. doi:https://doi.org/10.1088/0957-4484/19/17/175306
Brusatin G, Della Giustina G, Guglielmi M, Casabolni M, Prosposito P, Schutzmann S et al (2007) Mater Sci Eng C 27:1022. doi:https://doi.org/10.1016/j.msec.2006.06.020
Jabbour J, Callas-Etienne S, Smaihi M, Gatti S, Kribich R, Pille G et al (2007) Appl Surf Sci 253:8032. doi:https://doi.org/10.1016/j.apsusc.2007.02.079
Jabbour J, Callas S, Smaihi M, Gatti S, Etienne P (2008) J Non-Cryst Sol 354:1001
Jabbour J, Callas S, Gatti S, Kribich R, Myara M, Pille G et al (2008) J Non-Cryst Sol 354:651
Capozzi CA, Pye LD (1988) Proc SPIE 970:135
Babonneau F, Maquet J (2000) Polyhedron 19:315. doi:https://doi.org/10.1016/S0277-5387(99)00361-7
Viart N, Rehspringer JL (1996) J Non-Cryst Sol 195:223
Philipp G, Schmidt H (1986) J Non-Cryst Sol 82:31
Nass R, Arpac E, Glaubitt W, Schmidt H (1990) J Non-Cryst Sol 121:370
Schmidt H, Seiferling B (1986) Mater Res Soc Symp Proc 73:739
Primeau N, Vautey C, Langlet M (1997) Thin Solid Films 310:47. doi:https://doi.org/10.1016/S0040-6090(97)00340-4
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Briche, S., Riassetto, D., Gastaldin, C. et al. Sol–gel processing and UVA patterning of epoxy-based hybrid organic–inorganic thin films. J Mater Sci 43, 5809–5822 (2008). https://doi.org/10.1007/s10853-008-2884-7
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10853-008-2884-7