Abstract
Nickel and copper were potentiostatically deposited onto monocrystalline n-Si (100) wafers and in nanoporous SiO2/Si template from 0.5 M NiSO4 + 0.5 M H3BO3 and 0.005 M CuSO4 + 0.5 M H3BO3 solutions. Nanoporous SiO2/Si template was formed by etching in dilute HF solution of ion tracks. The latter were produced by high-energy (380 MeV) Au+ ions bombardment of silicon oxide thermally grown on silicon (100) substrate. The deposition of metals was studied using cyclic voltammetry (CV), chronoamperometry; the structure and morphology of products were ex-situ investigated by SEM and XRD. The level of pores filling was controlled by deposition time. Electrodeposition occurred selectively into nanopores and the deposition on SiO2 layer was excluded. It was found out that Ni and Cu electrodeposited into nanopores of SiO2/Si system formed the same structures as at electrodeposition on the surface of monocrystalline n-Si—granules for Ni and scale-shaped particles for Cu deposits.
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Fink D (2004) Fundamentals of ion-irradiated polymers. Springer Series in Materials Science, vol 63
Fink D, Alegaonkar PS, Petrov AV, Berdinsky AS, Rao V, Müller M, Dwivedi KK, Chadderton LT (2003) Radiat Measur 36:605
Fink D, Petrov AV, Hoppe K, Fahrner WR et al (2004) Nucl Instr Meth B218:355
Fink D, Alegaonkar PS, Petrov AV, Wilhelm M, Szimkowiak P, Behar M, Sinha D, Fahrner WR, Hoppe K, Chadderton LT (2005) Nucl Instr Meth B236:11
Sinha D, Petrov AV, Fink D, Fahrner WR, Hoppe K, Chandra A (2004) Radiat Effects Defects Solids 159:517
Fink D, Sinha D, Opitz-Coutureau J, Petrov AV, Demyanov SE, Fahrner WR, Hoppe K, Fedotov AK, Chadderton LT, Berdinsky AS (2005) In: Borisenko VE, Gaponenko SV, Gurin VS (eds) Physics, chemistry and application of nanostructures. World Scientific Pubs., p 474
Ivanou DK, Streltsov EA, Fedotov AK, Mazanik AV, Fink D, Petrov A, Tkazyk Z, Wosinski T, Figielski T (2005) In: Pődör B, Horváth J, Basa P (eds) Semiconductor nanocrystals (Proc. of the 1st Intern. Workshop on Semicond. Nanocrystals “SEMINANO-2005”, Budapest, Hungary, September 2005), p 63
Ivanou DK, Streltsov EA, Fedotov AK, Mazanik AV, Fink D, Petrov A (2005) Thin Solid Films 490:154
Ubara H, Imura T, Hiraki A (1984) Solid State Commun 50:673
Niwa D, Takano N, Yamada T, Osaka T (2003) Electrochim Acta 48:195
Gurevich YuYa, Pleskov YuV (1983) Photoelektrokhimija poluprovodnikov. Nauka, Moscow, p 176 (in Russian)
Rashkova B, Guel B, Pötzschke RT, Staikov G (1998) Electrochim Acta 43:3021
Munoz AG (2006) Surf Coat Technol 201:3030
Oskam G, Long JG, Natarajan A, Searson PC (1998) J Phys D: Appl Phys 31:1927
Pasa AA, Munford ML, Voltolini E, Seligmana L, Sardelab M, Sartorelli ML (2001) In: Proceedings of the magnetic materials, processes, and devices VI. The Electrochemical Society, vol 2000, p 137
Ji C, Oskam G, Searson PC (2001) Surf Sci 492:115
Ivanova YuA, Ivanou DK, Streltsov EA (2007) Electrochem Commun 9:599
Ivanova YuA, Ivanou DK, Streltsov EA (2007) Electrochim Acta 52:5213
Gunawardena G, Hills G, Montenegro I, Scharifker B (1982) J Electroanal Chem 138:225
Krumm R, Guel B, Schmitz C, Staikov G (2000) Electrochim Acta 45:3255
Pasa AA, Scharzacher W (1999) Phys Stat Sol(a) 173:73
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This work was supported by the Belarusian Foundation for Basic Research (Project X07M-128).
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Ivanova, Y.A., Ivanou, D.K., Fedotov, A.K. et al. Electrochemical deposition of Ni and Cu onto monocrystalline n-Si(100) wafers and into nanopores in Si/SiO2 template. J Mater Sci 42, 9163–9169 (2007). https://doi.org/10.1007/s10853-007-1926-x
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DOI: https://doi.org/10.1007/s10853-007-1926-x