Journal of Materials Science

, Volume 40, Issue 17, pp 4531–4539 | Cite as

Development and surface characterization of positively charged filters

  • N. Kattamuri
  • J. H. Shin
  • B. Kang
  • C. G. Lee
  • J. K. Lee
  • C. Sung
Article

Abstract

Filter media, which have been surface charge modified by modifiers with positive functional groups, are termed positively charged filters. The main aim of the present work was to manufacture positively charged filters for capturing negatively charged particles, mainly bacteria and virus from water. Filters were manufactured with varying ratios of base materials, processing conditions and charge modifiers. Experimental parameters were varied in order to attain filters with a high zeta potential to increase the filtration efficiency. A positive zeta potential of 42.56 mV has been attained with a charge modifier percentage of 100%, a stirring time of 30 minu., vacuum pressure of 15 cm Hg. Statistical analysis was performed to find the most significant parameter for positive charge modification.

Keywords

Polymer Filtration Processing Condition Surface Charge Positive Charge 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    OSTRIECHER and A. EUGENE, US patent 4007113, February 8 1977.Google Scholar
  2. 2.
    C. KENNETH and S. DONALD, US Patent 6565749. May 20 2003.Google Scholar
  3. 3.
    M. D. SOBSEY and J. S. GLASS, Appl. Environ. Microbiol (1980) 201.Google Scholar
  4. 4.
    M. D SOBSEY and T. CROMEANS, ibid. 49 (1985) 795.PubMedGoogle Scholar
  5. 5.
    M. D SOBSEY and A. R. HICKEY, ibid. 49 (1985) 259.PubMedGoogle Scholar
  6. 6.
    J. J BORREGO and R.CORNAX, ibid. 57(9) (1991) 2502.PubMedGoogle Scholar
  7. 7.
    KENNETH HOU, P. CHARLES, Appl. Envi Micro. (1980) 892.Google Scholar
  8. 8.
    LUCA CIPLETTI and M. CARPINETI, Langmuir (1996) 6446.Google Scholar
  9. 9.
    N. WEI and R. J LYNG, US Patent 6673447, January 6 2004.Google Scholar
  10. 10.
    K. HOU and D. BRETL, US Patent 6565749, May 20 2003.Google Scholar

Copyright information

© Springer Science + Business Media, Inc. 2005

Authors and Affiliations

  • N. Kattamuri
    • 1
  • J. H. Shin
    • 2
  • B. Kang
    • 2
  • C. G. Lee
    • 3
  • J. K. Lee
    • 3
  • C. Sung
    • 4
  1. 1.Center for Advanced Materials, Department of Chemical EngineeringUniversity of MassachusettsLowellUSA
  2. 2.Department of Mechanical EngineeringPusan National UniversityPusanSouth Korea
  3. 3.Department of Mechanical EngineeringPusan National UniversityGumjeoung-GU PusanSouth Korea
  4. 4.School of NanoengineeringInje UniversityGimhaeKorea

Personalised recommendations