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Microwave permittivity of MWCNT, Ca1 − xBaxBi2Nb2O9 (0 ≤ x ≤ 1) and MWCNT/ Ca1 − xBaxBi2Nb2O9 (0 ≤ x ≤ 1) layered composite thick films using microstrip ring resonator overlay method

  • Varsha D. PhadtareEmail author
  • Vinayak G. Parale
  • Vijaya R. Puri
  • Hyung-Ho ParkEmail author
Article
  • 37 Downloads

Abstract

The microwave dielectric properties of the multiwalled carbon nanotubes (MWCNT) thick film, Ca1 − xBaxBi2Nb2O9 (x = 0, 0.2, 0.4, 0.6, 0.8, and 1) (CBBNO) thick films, and MWCNT/CBBNO layered thick film composites in the 8–18 GHz were determined by the overlay method using the microstrip ring resonator (MSRR). Microwave properties were studied by perturbation of MSRR due to the overlay of thick films of different materials. The MWCNT thick film, CBBNO thick film, and MWCNT/CBBNO layered composite thick films were screen-printed on an alumina substrate. The experimental data was obtained for the material and/or composition dependent peak output and the resonance frequency of the MSRR. In addition, the numerical results were obtained for first harmonic radiated in the X-band region from the MSRR operating in Ku-band (15.45 GHz) frequency region. The comparison was done for the X and Ku-band responses of MSRR due to perturbation of screen-printed MWCNT thick film, CBBNO thick film, and MWCNT/CBBNO layered thick film composites.

Keywords

Thick film Overlay Microstrip ring resonator Microwave permittivity 

Notes

Acknowledgments

One of the authors Dr. Vijaya Puri gratefully acknowledges UGC, New Delhi, India for the award of Research Scientist ‘C’. The author Hyung-Ho Park acknowledges Nano-Convergence Foundation (www.nanotech2020.org) funded by the Ministry of Science and ICT (MSIT, Korea) & the Ministry of Trade, Industry and Energy (MOTIE, Korea) [Project Name: Commercialization development of super thermal insulation aerogel composite foam for cold insulation material].

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Copyright information

© Springer Science+Business Media, LLC, part of Springer Nature 2019

Authors and Affiliations

  1. 1.Thick and Thin Film Device Laboratory, Department of PhysicsShivaji UniversityKolhapurIndia
  2. 2.Department of Materials Science and EngineeringYonsei UniversitySeoulSouth Korea

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