Abstract
We have investigated electrical, optical, and structural properties of indium tin oxide (ITO) co-sputtered indium zinc oxide (IZO) film prepared by a dual target direct current (DC) magnetron sputtering at room temperature in pure Ar ambient. It was shown that the resistivity and sheet resistance of ITO co-sputtered IZO films monotonically increased with increasing DC power of ITO target at constant DC power of IZO target. Synchrotron X-ray scattering and scanning electron microscope examination results show that addition of ITO in the IZO film lead to crystallization of IZTO film due to low transition temperature of the ITO from amorphous to crystalline. However, ITO co-sputtered IZO film (ITO/IZO power = 100 W:100 W) exhibit higher work function than those of pure IZO and ITO film. It was found that the work function as well as the electrical, optical, and surface properties of the IZTO film could be controlled by varying the DC power of IZO and ITO targets, respectively.
Similar content being viewed by others
References
D.D. Edwards, T.O. Mason, F. Gouenoire, K.R. Poeppelmeier, Appl. Phys. Lett. 70, 1706 (1997)
T. Minami, J. Vac, Sci. Technol. A. 17, 1765 (1999)
X. Jiang, F.L. Wong, M.K. Fung, S.T. Lee, Appl. Phys. Lett. 83, 1875 (2003)
J.-H. Bae, J.-M. Moon, H.-K. Kim, J.-W. Kang, H.-D. Park, J.-J. Kim, W.J. Cho, J. Electrochem. Soc. 154, 81 (2007)
R.B.H. Tahar, T. Ban, Y. Ohya, Y. Takahashi, J. Appl. Phys. 83, 2631 (1998)
J.-W. Kang, W.-I. Jeong, J.-J. Kim, H.-K. Kim, D.-G. Kim, G.-H. Lee, Electrochem. Solid-State Lett. 10, 75 (2007)
C.J. Brabec, N.S. Sariciftci, J.C. Hummelen, Adv. Func. Mater. 11, 15 (2001)
H. Han, D. Adams, J.W. Mayer, T.L. Alford, J. Appl. Phys. 98, 083705 (2005)
J.-M. Moon, J.-H. Bae, J.-A. Jeong, S.-W. Jeong, N.-J. Park, H.-K. Kim, J.-W. Kang, J.-J. Kim, M.-S. Yi, Appl. Phys. Lett. 90, 163516 (2007)
J.M. Phillips, R.J. Cava, G.A. Thomas, S.A. Carter, J. Kwo, T. Siegrist, J.J. Krajewski, J.H. Marshall, W.F. Peck Jr., D.H. Rapkine, Appl. Phys. Lett. 67, 2246 (1995)
T. Minami, T. Yamamoto, Y. Toda, T. Miyata, Thin Solid Films 373, 189 (2000)
A. Ambrosini, S. Malo, K.R. Poeppelmeier, M.A. Lane, C.R. Kannewurf, T.O. Mason, Chem. Mater. 14, 58 (2002)
N. Naghavi, C. Marcel, L. Dupont, C. Guery, C. Maugy, J.M. Tarascon, Thin Solid Films 419, 160 (2002)
T.J. Marks, J.G.C. Veinot, J. Cui, H. Yan, A. Wang, N.L. Edleman, J. Ni, Q. Huang, P. Lee, N.R. Armstron, Synthetic Metals 127, 29 (2002)
J. Cui, A. Wang, N.L. Edleman, J. Ni, P. Lee, N.R. Armstrong, T.J. Marks, Adv. Mater. 13, 1476 (2001)
T. Oyama, N. Hashimoto, J. Shimizu, Y. Akao, H. Kojima, K. Aikawa, K. Suzuki, J. Vac. Sci. and Technol. A 10, 1682 (1992)
Acknowledgement
This work was supported by Korea Research Foundation Grant funded by Korea Government (MOEHRD: Basic Research Promotion Fund) (KRF-2006-331-D00243).
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Jeong, JA., Choi, KH., Bae, JH. et al. Electrical, optical, and structural properties of ITO co-sputtered IZO films by dual target magnetron sputtering. J Electroceram 23, 361–366 (2009). https://doi.org/10.1007/s10832-008-9468-4
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10832-008-9468-4