Journal of Electroceramics

, Volume 21, Issue 1–4, pp 641–644 | Cite as

Preparation and properties of Pb(Zr, Ti)O3 ferroelectric thin films and compositionally graded thin films on LaNiO3/Si substrates

  • Li Jiankang
  • Yao Xi


LaNiO3 (LNO) thin films were prepared on Si (100) wafer by MOD method. Pb(Zr, Ti)O3 ferroelectric thin films and their compositionally graded thin films were prepared on LNO/Si (100) substrates by a modified sol–gel method. The composition depth profile of a graded film was determined by using a combination of Auger electron spectroscopy and Ar ion etching. The results confirmed that the processing method produces graded composition change. XRD analysis showed that the graded thin film possessed a composite structure of tetragonal and rhombohedral. The dielectric constant of the graded thin films was higher than that of each thin film unit, but the loss tangent was near to each other at 10 kHz. The temperature characteristics of the dielectric constant of the graded thin films at different frequencies showed three peaks and ferroelectric relaxor feature to some extent. Hysteresis loops showed that graded thin film had higher remanent polarization, smaller coercive field than each thin film unit. The pyroelectric coefficient of the graded thin films increased gradually with temperature, and was higher than that of each thin film unit.


Compositionally graded thin film LaNiO3 electrode Pb(Zr, Ti)O3 



This work was supported by the Jiangsu Provincial Natural Science Foundation (No. BK2005039) and the Jiangsu University Natural Science Research Project (No. 05KJB430127).


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Copyright information

© Springer Science+Business Media, LLC 2007

Authors and Affiliations

  1. 1.Department of Applied PhysicsUniversity of Science and Technology of SuzhouSuzhouChina
  2. 2.Electronic Material Research LaboratoryXi’an Jiaotong UniversityXi’anChina

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