A new patterning method combining electron beam (EB) lithography and electrophoretic deposition (EPD) for fabricating micropatterned barium titanate (BaTiO3) thin films was investigated. At first, resist molds with high resolution were prepared using EB lithography on Pt/Ti/Si substrates. Then BaTiO3 nanoparticles were deposited on the substrates by EPD from a transparent suspension of monodispersed BaTiO3 nanoparticles; a mixed solvent of 2-methoxyethonal and acetylacetone with a 9:1 volumetric ratio was used as a dispersion medium. The nanoparticles with an average size of about 10 nm were synthesized at a low temperature of 90 °C by a high concentration sol-gel process. EPD layers superfluously deposited on the resist molds were mechanically polished away, followed by chemically removing the molds in a resist remover to leave micropatterns of BaTiO3 nanoparticles on the substrates, which were finally sintered to yield micropatterned BaTiO3 ceramic thin films. The method developed may be used to fabricate other micropatterned electroceramic thin films.
Barium titanate Micropatterning Thin film Electron beam lithography Electrophoretic deposition Sol-gel process
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This work is partially supported by a Grant-in-Aid (no. 16206065) from the Japan Society for the Promotion of Science (JSPS). Y. J. Wu is grateful to the JSPS for a Fellowship.
S. Ramesh, B.A. Shutzberg, C. Huang, J. Gao, E.P. Giannelis, IEEE Trans. Adv. Packaging 26, 17 (2003)CrossRefGoogle Scholar