Journal of Electroceramics

, Volume 16, Issue 4, pp 561–564 | Cite as

Dielectric measurement using non-contact microwave single probe for dielectric materials

  • Hirofumi Kakemoto
  • Song-Min Nam
  • Satoshi Wada
  • Takaaki Tsurumi
Section 2: Thin Film


A high frequency dielectric measurement method was proposed using a non-contact probe. The microwave reflection intensity was measured for Al2O3 and SrTiO3 substrates at room temperature as a function of distance between sample and probe. The difference of reflection intensity for Al2O3 and SrTiO3 substrates was observed in the region where the distance of 0.2 mm between sample and probe, and it was caused from dielectric permittivities of samples. The reflection coefficient of sample was estimated in comparison with results of electromagnetic simulation. The reflection intensity for Al2O3 and SrTiO3 substrates was transformed to dielectric permittivity at reflection intensity minimum point.


Microwave Non-contact probe Reflection intensity Dielectric materials 


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Copyright information

© Springer Science + Business Media, LLC 2006

Authors and Affiliations

  • Hirofumi Kakemoto
    • 1
  • Song-Min Nam
    • 1
  • Satoshi Wada
    • 1
  • Takaaki Tsurumi
    • 1
  1. 1.Graduate School of Science and EngineeringTokyo Institute of TechnologyTokyoJapan

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