Journal of Electroceramics

, Volume 16, Issue 1, pp 9–14 | Cite as

Electron beam lithographic techniques and electrochemical reactions for the micro- and nanostructuring of surfaces under extreme conditions



An overview of nanostructuring of surfaces using electron-beam lithographic approaches combined with electrochemical techniques is given. We report the compatibility of conventional electron-beam lithography as well as an alternative method (electron-beam-induced deposition) with electroplating of metals and electrochemical etching of the substrates. This paper describes how to exploit these electron beam-writing techniques for highly selective electrochemical reactions at various surfaces. The ability to use electron beam-induced nanomasking even under extreme conditions is highlighted for the fabrication of structures in the sub-100 nm range.


Nanopatterning Electron-beam lithography Electron-beam-induced deposition Electrochemical reactions Extreme conditions 


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© Springer Science + Business Media, Inc. 2006

Authors and Affiliations

  1. 1.Dept. of Materials ScienceInstitute for Surface Science and Corrosion (LKO)ErlangenGermany

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