Deposition of LiNbO3 thin films for selective etching
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Ferroelectric lithium niobate (LiNbO3) thin films were epitaxially fabricated on sapphire (0001) and polycrystalline diamond substrates using pulsed laser deposition (PLD). Various deposition conditions are investigated to realize deposition of c-axis oriented LiNbO3 thin film. The LiNbO3 thin films were chemically etched after electric poling, being investigated by scanning electron microscope (SEM).
KeywordsFerroelectric Selective etching LiNbO3 PLD
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