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Journal of Electroceramics

, Volume 17, Issue 2–4, pp 933–935 | Cite as

Deposition of LiNbO3 thin films for selective etching

  • Hyun-Jun Kim
  • Dal-Young Kim
  • Jong-Yoon Ha
  • Chong-Yun Kang
  • Man Young Sung
  • Bong Hee Cho
  • Seok-Jin Yoon
  • Hyun-Jai Kim
3. Nanomaterials and synthesis

Abstract

Ferroelectric lithium niobate (LiNbO3) thin films were epitaxially fabricated on sapphire (0001) and polycrystalline diamond substrates using pulsed laser deposition (PLD). Various deposition conditions are investigated to realize deposition of c-axis oriented LiNbO3 thin film. The LiNbO3 thin films were chemically etched after electric poling, being investigated by scanning electron microscope (SEM).

Keywords

Ferroelectric Selective etching LiNbO3 PLD 

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Copyright information

© Springer Science + Business Media, LLC 2006

Authors and Affiliations

  • Hyun-Jun Kim
    • 1
    • 2
  • Dal-Young Kim
    • 3
  • Jong-Yoon Ha
    • 1
  • Chong-Yun Kang
    • 1
  • Man Young Sung
    • 2
  • Bong Hee Cho
    • 4
  • Seok-Jin Yoon
    • 1
  • Hyun-Jai Kim
    • 1
  1. 1.Thin Film Materials Research Center, KISTSeoulKorea
  2. 2.Department of Electrical EngineeringKorea UniversitySeoulKorea
  3. 3.Department of Visual OpticsSeoul National University of TechnologySeoulKorea
  4. 4.Department of Electrical EngineeringThe University of SuwonSuwonKorea

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