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Journal of Applied Spectroscopy

, Volume 75, Issue 2, pp 203–207 | Cite as

Paramagnetic properties of single-crystal silicon implanted with iron-group transition metals

  • A. P. Dostanko
  • A. O. Korobko
  • N. M. Lapchuk
Article

Abstract

Samples of single-crystal silicon implanted with iron-group ions are investigated by electron paramagnetic resonance (EPR). The change in relative permittivity μr of the silicon layer modified by implanted nickel ions is found. The accumulation kinetics of paramagnetic centers of amorphous regions of silicon implanted with Co, Ni, and Fe are shown to be different. Magnetic hysteresis for both the wide EPR line due to implanted impurities and the EPR line due to dangling chemical silicon bonds is found.

Key words

EPR spectroscopy silicon iron-group ions hysteresis 

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Copyright information

© Springer Science+Business Media, Inc. 2008

Authors and Affiliations

  • A. P. Dostanko
    • 1
  • A. O. Korobko
    • 1
  • N. M. Lapchuk
    • 2
  1. 1.Belarusian State University of Informatics and RadioelectronicsMinskBelarus
  2. 2.Belarusian State UniversityMinskBelarus

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