Journal of Applied Electrochemistry

, Volume 46, Issue 1, pp 39–46 | Cite as

Rapid screening of plating additives for bottom-up metallization of nano-scale features

  • Lindsay Boehme
  • Uziel Landau
Research Article
Part of the following topical collections:
  1. Electrodeposition


An improved test for rapid determination of the efficacy of additives systems for use in bottom-up copper metallization of micro- and nano-scale features is introduced as a replacement for the classical injection technique. The conventional injection test is based on measuring the polarization response to the injection of an additive into a solution in which a rotating disk electrode is plated at a moderate constant current density of about 10 mA cm−2. The inaccurate assumptions underlying this test and its limitations are discussed. The modified screening technique introduced here is based on the recognition that bottom-up metallization of micro- and nano-scale features is carried out at a constant overpotential where the current density at the inhibited regions of the feature is significantly lower, on the order of 1 mA cm−2. A single polarization measurement at this low current density in an electrolyte containing the tested suppressors is suggested. The suppressors exhibiting the largest overpotentials are considered promising and should be selected for further characterization.


Electroplating Additives Copper metallization Bottom-up fill 

List of Symbols


Standard potential


Faraday’s constant


Current density


Current density at feature bottom


Limiting current density


Current density at feature rim and top of wafer


Feature depth


Number of electrons transferred


Radius of working electrode


Feature radius


Universal gas constant




Applied potential


Activation overpotential


Concentration overpotential


Ohmic overpotential


Overpotential at feature bottom


Overpotential at feature rim and top surface


Electrolyte conductivity


Electrostatic potential in solution


Electrostatic potential in solution at feature bottom


Electrostatic potential in solution at feature top



The authors gratefully acknowledge support from Atotech for this work. Coupon plating studies were assisted by Jun Wu (Atotech).


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Copyright information

© Springer Science+Business Media Dordrecht 2015

Authors and Affiliations

  1. 1.Department of Chemical and Biomolecular EngineeringCase Western Reserve UniversityClevelandUSA

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