Advertisement

Journal of Applied Electrochemistry

, Volume 42, Issue 5, pp 333–339 | Cite as

Electrochemical deposition of Co–Sb thin films on nanostructured gold

  • Ruxandra Vidu
  • Simon Li
  • Dat V. Quach
  • Pieter Stroeve
Original Paper

Abstract

The electrochemical behavior of the Co–Sb system on Au substrate during cyclic voltammetry and potentiostatic deposition was investigated. Electrochemical behavior of Co and Sb was studied and compared to the Co–Sb system. At a negative potential (−0.9 V vs. Ag/AgCl) the electrochemical behavior of this binary system was similar to that of individual Co and Sb combined. For more negative vertex potentials (e.g., −1.2 V vs. Ag/AgCl), results from cyclic voltammetry have shown the presence of a new compound different from Co and Sb which could only be detected at slow sweep rate. The deposition performed at constant potentials between −1.0 and −1.2 V have resulted in films that were made of CoSb3 and Sb as indicated by XRD. Surface film studied by SEM and EDS has shown morphological and compositional non-uniformities caused by hydrogen evolution.

Keywords

Thermoelectric Electrochemical deposition Cyclic voltammetry Thin film Skutterudite Cobalt triantimonide 

References

  1. 1.
    Vining CB (2009) Nat Mater 8:83CrossRefGoogle Scholar
  2. 2.
    Boukai AI, Bunimovich Y, Tahir-Kheli J, Yu JK, Goddard WA, Heath JR (2008) Nature 451:168CrossRefGoogle Scholar
  3. 3.
    Hicks LD, Dresselhaus MS (1993) Phys Rev B 47:12727CrossRefGoogle Scholar
  4. 4.
    Hicks LD, Dresselhaus MS (1993) Phys Rev B 47:16631CrossRefGoogle Scholar
  5. 5.
    Venkatasubramanian R, Siivola E, Colpitts T, O’Quinn B (2001) Nature 413:597CrossRefGoogle Scholar
  6. 6.
    Mi JL, Zhu TJ, Zhao XB, Ma J (2007) J Appl Phys 101:054314CrossRefGoogle Scholar
  7. 7.
    Sales BC, Mandrus D, Williams RK (1996) Science 272:1325CrossRefGoogle Scholar
  8. 8.
    Yan JW, Wu Q, Shang WH, Mao BW (2004) Electrochem Commun 6:843CrossRefGoogle Scholar
  9. 9.
    Caylor JC, Stacy AM, Gronsky R, Sands T (2001) J Appl Phys 89:3508CrossRefGoogle Scholar
  10. 10.
    Chen LJ, Hu HN, Li YX, Chen GF, Yu SY, Wu GH (2006) Chem Lett 35:170CrossRefGoogle Scholar
  11. 11.
    Cheng H, Hng HH, Ma J, Xu XJ (2008) J Mater Res 23:3013CrossRefGoogle Scholar
  12. 12.
    Behnke J, Prieto AL, Stacy AM, Sands T (1999) In: Proceedings of the 18th international conference on thermoelectrics, IEEE, Piscataway, p 451Google Scholar
  13. 13.
    Flis-Kabulska I (2006) J Appl Electrochem 36:131CrossRefGoogle Scholar
  14. 14.
    Li FH, Wang W, Gao JP, Wang SY (2009) J Electrochem Soc 156:D84CrossRefGoogle Scholar
  15. 15.
    Sadana YN, Kumar R (1980) Surf Technol 11:37CrossRefGoogle Scholar
  16. 16.
    Quach DV, Vidu R, Groza JR, Stroeve P (2010) Ind Eng Chem Res 49:11385CrossRefGoogle Scholar
  17. 17.
    Vidu R (2000) PhD thesis, Graduate School of Materials Engineering and Processing, Osaka University, JapanGoogle Scholar
  18. 18.
    Vidu R, Hara S (1999) J Electroanal Chem 475:171CrossRefGoogle Scholar
  19. 19.
    Vidu R, Hara S (1999) Scripta Mater 41:617CrossRefGoogle Scholar
  20. 20.
    Vidu R, Hara S (1999) Electrochemistry 67:1240Google Scholar
  21. 21.
    Vidu R, Hara S (1999) J Vac Sci Technol B 17:2423CrossRefGoogle Scholar
  22. 22.
    Vidu R, Hara S (2000) Surf Sci 452:229CrossRefGoogle Scholar
  23. 23.
    Vidu R, Hirai N, Hara S (2001) Phys Chem Chem Phys 3:3320CrossRefGoogle Scholar
  24. 24.
    Hamelin A, Martins AM (1996) J Electroanal Chem 407:13CrossRefGoogle Scholar
  25. 25.
    Jung G, Rhee C (1997) J Electroanal Chem 436:277CrossRefGoogle Scholar
  26. 26.
    Pourbaix M (1966) Atlas of electrochemical equilibria in aqueous solutions. Pergamon Press, New YorkGoogle Scholar
  27. 27.
    Bubendorff JL, Meny C, Beaurepaire E, Panissod P, Bucher JP (2000) Eur Phys J B 17:635CrossRefGoogle Scholar
  28. 28.
    Pandey RK, Sahu SN, Chandra S (1996) Handbook of semiconductor electrodeposition. Marcel Dekker Inc, New YorkGoogle Scholar
  29. 29.
    Abou-Krisha MM (2011) Mater Chem Phys 125:621CrossRefGoogle Scholar
  30. 30.
    Yang ML, Hu ZB (2005) J Electroanal Chem 583:46CrossRefGoogle Scholar

Copyright information

© Springer Science+Business Media B.V. 2012

Authors and Affiliations

  • Ruxandra Vidu
    • 2
  • Simon Li
    • 1
  • Dat V. Quach
    • 1
  • Pieter Stroeve
    • 1
  1. 1.Department of Chemical Engineering & Materials ScienceUniversity of California, DavisDavisUSA
  2. 2.NanoRISSacramentoUSA

Personalised recommendations