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Electrical properties of films grown on W and Mo substrates by titanium ion implantation in nitrogen atmosphere

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Abstract

Films consisting of alternating nitride and oxide layers differing in phase composition and structure are grown on polycrystalline tungsten and molybdenum substrates by ion implantation. The resistivity and thermoelectric power of the films are measured as functions of temperature, and the temperature coefficient of their resistance is determined. The phase composition and electrical properties of the films are shown to be governed by the nitrogen-ion dose delivered to the titanium target.

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Authors and Affiliations

  1. Donetsk National University, Universitetskaya ul. 24, 83055, Donetsk, Ukraine

    P. I. Ignatenko & M. Yu. Badekin

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  1. P. I. Ignatenko
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  2. M. Yu. Badekin
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Translated from Neorganicheskie Materialy, Vol. 41, No. 3, 2005, pp. 301–304.

Original Russian Text Copyright © 2005 by Ignatenko, Badekin.

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Ignatenko, P.I., Badekin, M.Y. Electrical properties of films grown on W and Mo substrates by titanium ion implantation in nitrogen atmosphere. Inorg Mater 41, 243–246 (2005). https://doi.org/10.1007/s10789-005-0117-x

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  • DOI: https://doi.org/10.1007/s10789-005-0117-x

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