Silicon Wafer Surface-Temperature Monitoring System for Plasma Etching Process
- 148 Downloads
A thermoreflectance temperature measuring system was developed with the aim to realize monitoring of the silicon wafer surface temperature during plasma etching. The thermoreflectance detects variations in temperature through changes in optical reflectance. To overcome such difficulties as low sensitivity and limitation in installation space and position for in situ measurements, the differential thermoreflectance utilizing two orthogonal polarizations was introduced. Noise such as fluctuations in the incident beam intensity or changes of loss in the optical path would affect both polarizations equally and would not affect the measurement. The large angle of incidence of the beam allows measurement to be performed from outside the viewing ports of existing plasma etching process chambers through the gap between the plasma electrode and the silicon wafer. In this article, an off-line measurement result is presented, with results for bare wafers as well as for wafers with metal depositions. A prototype system developed for tests in plasma etching facilities in a production line is described.
KeywordsIn situ measurement Plasma etching process Polarization differential technique Rotating-analyzer ellipsometer Silicon wafer Temperature measurement Thermoreflectance
Unable to display preview. Download preview PDF.
- 1.International Technology Roadmap for Semiconductors: 2009 Edition: Front End Processes. Available at http://www.itrs.net/Links/2009ITRS/2009Chapters_2009Tables/2009_FEP.pdf
- 4.A.S. Lee, P.M. Norris, in Proceedings of National Heat Transfer Conference 5, HTD-vol. 327 (1996), pp. 41–46Google Scholar
- 5.R.M. Azzam, N.M. Bashara, Ellipsometry and Polarized Light (North-Holland, Amsterdam, 1977)Google Scholar
- 7.Y. Liu, A. Mandelis, in Radiometric Temperature Measurements I. Fundamentals, chap. 7, ed. by Z. Zhang, B. Tsai, G. Machin (Elsevier, Amsterdam, 2009)Google Scholar