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High Energy Chemistry

, Volume 39, Issue 3, pp 179–183 | Cite as

Simulation of exposure of light-sensitive layers: Processes involving reversible reactions

  • S. V. Zelentsov
  • I. V. Simdyanov
Processes and Materials for Optical Information Systems

Abstract

Analytic expressions relating the concentration of a light-sensitive component and the intensity of exposure UV light to the sample thickness and exposure time of light-sensitive materials with the restricted mobility of reactants were found. The processes of image formation were considered, which involve the following reversible photochemical reactions: (1) both steps are photochemical, \(A\underset{{\phi _2 }}{\overset{{\phi _1 }}{\longleftrightarrow}}B\); (2) a thermal reaction acts as a reversible step, \(A\underset{k}{\overset{\phi }{\longleftrightarrow}}B\); and (3) both thermal and photochemical reactions are reversible steps, \(A\underset{{\phi _2 k}}{\overset{{\phi _1 }}{\longleftrightarrow}}B\).

Keywords

Physical Chemistry Exposure Time Reversible Reaction Sample Thickness Photochemical Reaction 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© MAIK “Nauka/Interperiodica” 2005

Authors and Affiliations

  • S. V. Zelentsov
    • 1
  • I. V. Simdyanov
    • 1
  1. 1.Nizhni Novgorod State UniversityNizhni NovgorodRussia

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