Deposition of teflon-like protective layers in surface discharge at atmospheric pressure
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Recently the technologies based on atmospheric pressure plasma sources become very promising tool for the control of surface properties of solids while the desirable bulk properties are kept. In this work the surface barrier discharge operated at atmospheric pressure was used for deposition of thin protective hydrophobic films from mixture of nitrogen with C4F8 on the paper substrate. The plasma parameters were investigated by means of optical emission spectroscopy. Surface properties of the deposited thin films were studied by means of the contact angle measurements. The colorimetric parameters such as whiteness, yellowness or brightness of samples were measured in its deposited state and also in UV exposed states.
Key wordsplasma discharge protective coatings deposition
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