Czechoslovak Journal of Physics

, Volume 56, Issue 3, pp 267–276 | Cite as

Structure analysis of thin iron-silicide film from φ-scan RHEED Patterson function

  • Oleksandr Romanyuk
  • Keita Kataoka
  • Fumihiko Matsui
  • Ken Hattori
  • Hiroshi Daimon


The atomic structure of thin iron silicide film, grown epitaxially on the Si(111) surface, has been analyzed by means of the three-dimensional RHEED Patterson function analysis. The iron-silicide-terminated surface with (2 × 2) periodicity has been prepared by a solid-phase epitaxy method. 2 ML of Fe were deposited on the Si(111)-(7 × 7) surface and annealed at 500°C. Three-dimensional Patterson function was calculated from series of φ-scanned RHEED intensity distributions converted to the k-space. The resulting model of γ-FeSi2 structure consists of two silicide layers faulted to each other with three relaxed Si adatoms above the H3 site.


61.14.Hg 68.55.—a 

Key words

Patterson function RHEED iron silicide structure analysis 


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Copyright information

© Institute of Physics, Academy of Sciences of Czech Republic 2006

Authors and Affiliations

  • Oleksandr Romanyuk
    • 1
  • Keita Kataoka
    • 2
  • Fumihiko Matsui
    • 2
  • Ken Hattori
    • 2
  • Hiroshi Daimon
    • 2
  1. 1.Institute of PhysicsAcad. Sci. CRPraha 6Czech Republic
  2. 2.Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5, Takayama-cho, IkomaNaraJapan

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