, Volume 23, Issue 2, pp 265–273 | Cite as

Oxidative damage to DNA by 1,10-phenanthroline/l-threonine copper (II) complexes with chlorogenic acid

  • Yong Wang
  • Xiaoyan Zhang
  • Qianru Zhang
  • Zhousheng Yang


The oxidative DNA damage by copper (II) complexes in the presence of chlorogenic acid was explored using agarose gel electrophoresis. The extent of pBR322 DNA damage was enhanced significantly with increasing concentration of [Cu-phen-Thr] complex and incubation time. A fluorescence quenching activity of calf thymus DNA–EB was observed more remarkably with chlorogenic acid than without chlorogenic acid. The fluorescence measurements suggested that [Cu-phen-Thr] complex not only can bind to DNA by intercalation but also can damage the double strand DNA in the presence of chlorogenic acid. Further, 8-hydroxy-2′-deoxyguanosine, a biomarker of DNA oxidative damage was determined by electrochemical method. The control experiments revealed that the structure of copper (II) complexes affected capability of complex to DNA damage. The planar structure copper (II) complex showed high efficiency to DNA damage. The chlorogenic acid as biological reductant could improve copper (II) complex to DNA damage. A mechanism on [Cu-phen-Thr] complex to DNA damage in the presence of chlorogenic acid was proposed.


Copper (II) complexes Chlorogenic acid DNA damage Oxidative stress 







Chlorogenic acid


Tris-boracic acid-EDTA


Ethidium bromide




Hydroxyl radical



We thank the National Natural Science Foundation of China (Grant No. 20775002) for financial support. The work was supported by Program for Innovative Research Team in Anhui Normal University.


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Copyright information

© Springer Science+Business Media, LLC. 2009

Authors and Affiliations

  • Yong Wang
    • 1
  • Xiaoyan Zhang
    • 1
  • Qianru Zhang
    • 1
  • Zhousheng Yang
    • 1
  1. 1.College of Chemistry and Materials Science, Anhui Key Laboratory of Chemo-BiosensingAnhui Normal UniversityWuhuPeople’s Republic of China

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